Development of Nickel-Based Negative Tone Metal Oxide Cluster Resists for Sub-10 nm Electron Beam and Helium Ion Beam Lithography

Transition-metal oxide resists for electron-beam and focused-ion-beam lithography.

Journal of Photopolymer Science and Technology ◽

10.2494/photopolymer.7.585 ◽

1994 ◽

Vol 7 (3) ◽

pp. 585-594 ◽

Cited By ~ 2

Author(s):

TOSHIO IKEDA ◽

MAMORU BABA ◽

NOBUYOSHI KOSHIDA

Keyword(s):

Electron Beam ◽

Transition Metal ◽

Metal Oxide ◽

Focused Ion Beam ◽

Ion Beam ◽

Transition Metal Oxide ◽

Ion Beam Lithography

Organoiodine Functionality Bearing Resists for Electron-Beam and Helium Ion Beam Lithography: Complex and Sub-16 nm Patterning

ACS Applied Electronic Materials ◽

10.1021/acsaelm.0c01120 ◽

2021 ◽

Author(s):

Midathala Yogesh ◽

Mohamad. G. Moinuddin ◽

Manvendra Chauhan ◽

Satinder K. Sharma ◽

Subrata Ghosh ◽

...

Keyword(s):

Electron Beam ◽

Ion Beam ◽

Ion Beam Lithography ◽

Large-Scale Focused Helium Ion Beam Lithography

IEEE Transactions on Applied Superconductivity ◽

10.1109/tasc.2021.3057324 ◽

2021 ◽

Vol 31 (5) ◽

pp. 1-4

Author(s):

Jay C. LeFebvre ◽

Shane A. Cybart

Keyword(s):

Large Scale ◽

Ion Beam ◽

Ion Beam Lithography ◽

Novel Ti−O−Ti Bonding Species Constructed in a Metal−Oxide Cluster: Reaction Products of Bis(oxalato)oxotitanate(IV) with the Dimeric, 1,2-Dititanium(IV)-Substituted Keggin Polyoxotungstate

Inorganic Chemistry ◽

10.1021/ic060661i ◽

2006 ◽

Vol 45 (20) ◽

pp. 8078-8085 ◽

Cited By ~ 23

Author(s):

Kunihiko Hayashi ◽

Hideyuki Murakami ◽

Kenji Nomiya

Keyword(s):

Metal Oxide ◽

Reaction Products ◽

Oxide Cluster ◽

Cluster Reaction ◽

Promoting the Cleavage of C–O Bonds at the Interface between a Metal Oxide Cluster and a Co(0001) Support

ACS Catalysis ◽

10.1021/acscatal.0c03205 ◽

2020 ◽

Vol 10 (24) ◽

pp. 14722-14731

Author(s):

Renqin Zhang ◽

Motahare Athariboroujeny ◽

Greg Collinge ◽

Viacheslav Iablokov ◽

Kirill D. Shumilov ◽

...

Keyword(s):

Metal Oxide ◽

Oxide Cluster ◽

Synthesis and X-ray Analysis of Mn–Mo Mixed Metal Oxide Cluster with Cubic Framework

Chemistry Letters ◽

10.1246/cl.2000.1342 ◽

2000 ◽

Vol 29 (11) ◽

pp. 1342-1343 ◽

Cited By ~ 2

Author(s):

Koji Nishikawa ◽

Isamu Kinoshita ◽

Takanori Nishioka ◽

Kiyoshi Isobe

Keyword(s):

Metal Oxide ◽

Mixed Metal Oxide ◽

Oxide Cluster ◽

X Ray ◽

Mixed Metal ◽

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

Determination of resist exposure parameters in helium ion beam lithography: Absorbed energy gradient, contrast, and critical dose

10.1116/1.1319830 ◽

2000 ◽

Vol 18 (6) ◽

pp. 3177 ◽

Cited By ~ 6

Author(s):

P. Ruchhoeft ◽

J. C. Wolfe

Keyword(s):

Ion Beam ◽

Absorbed Energy ◽

Ion Beam Lithography ◽

Critical Dose ◽

Energy Gradient ◽

Magnetic interactions in a copper(II) trimer encapsulated in a molecular metal oxide cluster

Inorganic Chemistry ◽

10.1021/ic00274a014 ◽

1988 ◽

Vol 27 (1) ◽

pp. 59-62 ◽

Cited By ~ 10

Author(s):

G. F. Kokoszka ◽

F. Padula ◽

A. S. Goldstein ◽

E. L. Venturini ◽

L. Azevedo ◽

...

Keyword(s):

Metal Oxide ◽

Magnetic Interactions ◽

Oxide Cluster ◽

17 O NMR as a Tool in Discrete Metal Oxide Cluster Chemistry

Annual Reports on NMR Spectroscopy ◽

10.1016/bs.arnmr.2018.01.001 ◽

2018 ◽

pp. 187-248 ◽

Cited By ~ 4

Author(s):

C. André Ohlin ◽

William H. Casey

Keyword(s):

Metal Oxide ◽

Oxide Cluster ◽

Cluster Chemistry ◽

Sub-10 nm electron and helium ion beam lithography using a recently developed alumina resist

Microelectronic Engineering ◽

10.1016/j.mee.2018.02.015 ◽

2018 ◽

Vol 193 ◽

pp. 18-22 ◽

Cited By ~ 11

Author(s):

Andrea Cattoni ◽

Dominique Mailly ◽

Olivier Dalstein ◽

Marco Faustini ◽

Gediminas Seniutinas ◽

...

Keyword(s):

Ion Beam ◽

Ion Beam Lithography ◽