Bulk damage threshold and three-dimensional microstructuring of dielectrics using the self-focusing of ultrashort laser pulses

1998 ◽  
Author(s):  
D. Ashkenasi ◽  
A. Rosenfeld ◽  
H. Varel ◽  
M. Lorenz ◽  
E.E.B. Campbell
Keyword(s):  
Three Dimensional ◽  
Damage Threshold ◽  
Laser Pulses ◽  
Ultrashort Laser Pulses ◽  
The Self ◽  
Self Focusing ◽  
Ultrashort Laser

Measurement of the self-focusing threshold in aqueous media by ultrashort laser pulses

1997 ◽  
Author(s):  
Daniel X. Hammer ◽  
Gary D. Noojin ◽  
Robert J. Thomas ◽  
Richard A. Hopkins ◽  
Paul K. Kennedy ◽  
...  
Keyword(s):  
Aqueous Media ◽  
Laser Pulses ◽  
Ultrashort Laser Pulses ◽  
The Self ◽  
Self Focusing ◽  
Ultrashort Laser

Three-dimensional structuring of glass by ultrashort laser pulses

2003 ◽  
Author(s):  
Stefan Nolte ◽  
Matthias Will ◽  
Jonas Burghoff ◽  
Andreas Tuennermann
Keyword(s):  
Three Dimensional ◽  
Laser Pulses ◽  
Ultrashort Laser Pulses ◽  
Ultrashort Laser

scholarly journals Ablation of BaWO4 Crystal by Ultrashort Laser Pulses

Crystals ◽  
2020 ◽  
Vol 10 (9) ◽  
pp. 754
Author(s):  
Igor Kinyaevskiy ◽  
Pavel Danilov ◽  
Nikita Smirnov ◽  
Sergey Kudryashov ◽  
Andrey Koribut ◽  
...  
Keyword(s):  
Crystal Surface ◽  
Damage Threshold ◽  
Single Pulse ◽  
Laser Pulses ◽  
Ultrashort Laser Pulses ◽  
Pulse Irradiation ◽  
Optical Damage ◽  
Order Of Magnitude ◽  
Ultrashort Laser ◽  
Optical Damage Threshold

Ablation of BaWO4 Raman crystals with different impurity concentrations by ultrashort laser pulses was experimentally studied. Laser pulses with duration varying from 0.3 ps to 1.6 ps at wavelengths of 515 nm and 1030 nm were applied. A single-pulse optical damage threshold of the crystal surface changed from 1.3 J/cm2 to 4.2 J/cm2 depending on the laser pulse parameters and BaWO4 crystal purity. The optical damage threshold under multi-pulse irradiation was an order of magnitude less.

scholarly journals Ultrafast laser heating of non-plasmonic nanocylinders

2021 ◽  
Vol 2015 (1) ◽  
pp. 012104
Author(s):  
Olesia Pashina ◽  
Daniil Ryabov ◽  
George Zograf ◽  
Sergey Makarov ◽  
Mihail Petrov
Keyword(s):  
Damage Threshold ◽  
Laser Pulses ◽  
Dielectric Substrate ◽  
Ultrashort Laser Pulses ◽  
Experimental Conditions ◽  
Pulsed Heating ◽  
Heating Effects ◽  
Ultrashort Laser ◽  
Two Temperature ◽  
Thermal Stability Of

Abstract We develop a model describing non-equilibrium processes under the excitation of resonant semiconductor nanostructures with ultrashort laser pulses with a duration of about 100 fs. We focus on the heating effects related to pulsed excitation with account on free carriers generation, thermalization, and relaxation. The heat exchange between the electron and phonon system is treated within the two-temperature model. We applied the developed model to describing pulsed heating of silicon nanocylinder on top of a dielectric substrate. We come up with estimations of the thermal damage threshold of the considered structures which provides the limits for the experimental conditions and ensures thermal stability of the samples.

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