Determination of the mechanical stress in plasma enhanced chemical vapor deposited SiO2 and SiN layers

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.586809 ◽

1993 ◽

Vol 11 (3) ◽

pp. 614 ◽

Author(s):

P. Ambrée

Keyword(s):

Mechanical Stress ◽

Chemical Vapor ◽

Chemical Vapor Deposited

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