Effects of Strain-Induced Defects on Excess Carrier Lifetime and Ambipolar Diffusion in nipi-Doped In0.2Ga0.8As/GaAs Mqws

1995 ◽  
Vol 379 ◽  
Author(s):  
H.T. Lin ◽  
D.H. Rich ◽  
A. Larsson

ABSTRACTThe effects of strain-induced defects on excess carrier lifetime and transport in a nipi-doped In0.2Ga0.8As/GaAs multiple quantum well (MQW) structure were examined with a new method called electron beam-induced absorption modulation (EBIA) in which the kinetics of carrier transport and recombination are examined with a high-spatial, -spectral and -temporal resolution. The excess carrier lifetime and ambipolar diffusion were found to be reduced by factors of ∼1013 and ∼103 compared to theoretical values, respectively, and this is attributed to the presence of strain-induced defects. The MQW excitonic absorption coefficient sensitively depends on the carrier density in the QWs, as a result of screening of the electron-hole (e-h) Coulombic interaction. Likewise, ambipolar diffusion is found to depend on the excess carrier density in a nonlinear fashion, as a result of the e-h plasma-induced changes in the local depletion widths in the vicinity of structural defects.

1996 ◽  
Vol 69 (21) ◽  
pp. 3158-3160 ◽  
Author(s):  
K. Czotscher ◽  
S. Weisser ◽  
E. C. Larkins ◽  
J. Fleissner ◽  
J. D. Ralston ◽  
...  

1997 ◽  
Vol 71 (5) ◽  
pp. 647-649 ◽  
Author(s):  
Daniel X. Zhu ◽  
Serge Dubovitsky ◽  
William H. Steier ◽  
Johan Burger ◽  
Denis Tishinin ◽  
...  

2014 ◽  
Vol 4 (6) ◽  
pp. 1518-1525 ◽  
Author(s):  
Kasidit Toprasertpong ◽  
Naofumi Kasamatsu ◽  
Hiromasa Fujii ◽  
Tomoyuki Kada ◽  
Shigeo Asahi ◽  
...  

1997 ◽  
Vol 3 (2) ◽  
pp. 315-319 ◽  
Author(s):  
N. Tessler ◽  
S. Marcinkevicius ◽  
U. Olin ◽  
C.K.V. Silfvenius ◽  
B.F. Stalnacke ◽  
...  

1991 ◽  
Vol 59 (23) ◽  
pp. 3009-3011 ◽  
Author(s):  
D. C. Hutchings ◽  
C. B. Park ◽  
A. Miller

1994 ◽  
Vol 332 ◽  
Author(s):  
H. Kakibayashi ◽  
R. Tsuneta ◽  
F. Nagata

ABSTRACTComposition and strain depth profiles in heterostructures such as AlGaAs/GaAs, InGaAs/InP and SiGe/Si have been analyzed with a high resolution of 0.5 nm by using the thickness fringes in a transmission electron microscope image. This diagnostic method is found to successfully evaluate the compositional disordering caused by annealing multiple quantum well structures with abrupt interfaces, and determine the difference in strain distribution in the strained-layers with various lattice mismatches. Both the composition and strain depth-profiles are analyzed quantitatively by the image simulation based on the dynamical theory of electron diffraction. This method is also useful for sensitively detecting ion-implantation-induced defects.


1995 ◽  
Vol 78 (9) ◽  
pp. 5515-5517 ◽  
Author(s):  
Y. Chen ◽  
M. S. Wartak ◽  
H. Lu ◽  
T. Makino

Sign in / Sign up

Export Citation Format

Share Document