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Effects of a-Si:H resist vacuum-lithography processing on HgCdTe

2006 ◽  
Vol 35 (6) ◽  
pp. 1474-1480
Author(s):  
R. N. Jacobs ◽  
E. W. Robinson ◽  
M. Jaime-Vasquez ◽  
A. J. Stoltz ◽  
J. Markunas ◽  
...  
Keyword(s):  
Vacuum Lithography

Forming of "contact window" submicron topological structure by laser vacuum lithography

1993 ◽  
Author(s):  
Anatoly I. Sharendo ◽  
Victor V. Boksha ◽  
Eduard I. Tochitsky ◽  
Vyjacheslav E. Obukhov
Keyword(s):  
Topological Structure ◽  
Vacuum Lithography

Nanometer scale focused ion beam vacuum lithography using an ultrathin oxide resist

1991 ◽  
Author(s):  
Lloyd R. Harriott ◽  
Henryk Temkin ◽  
C. H. Chu ◽  
Yuh-Lin Wang ◽  
Y. F. Hsieh ◽  
...  
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Nanometer Scale ◽  
Ultrathin Oxide ◽  
Vacuum Lithography

Focused ion-beam vacuum lithography of InP with an ultrathin native oxide resist

1991 ◽  
Author(s):  
Yuh-Lin Wang ◽  
Henryk Temkin ◽  
Lloyd R. Harriott ◽  
Robert A. Hamm
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Native Oxide ◽  
Vacuum Lithography

A novel vacuum lithography with SiNx resist for focused ion beam exposure and dry etching development

1991 ◽  
Author(s):  
S. Takahashi ◽  
M. Ohashi ◽  
S. Fukatsu ◽  
Y. Shiraki ◽  
R. Ito
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Dry Etching ◽  
Vacuum Lithography

Vacuum lithography forinsitufabrication of buried semiconductor microstructures

1990 ◽  
Vol 57 (16) ◽  
pp. 1672-1674 ◽  
Author(s):  
Y. L. Wang ◽  
H. Temkin ◽  
L. R. Harriott ◽  
R. A. Hamm ◽  
J. S. Weiner
Keyword(s):  
Vacuum Lithography
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