Extreme Ultraviolet Lithography 2020
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45
(FIVE YEARS 2)

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Published By SPIE

9781510638426, 9781510638433
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

High-NA EUV lithography exposure tool: advantages and program progress

2021 ◽  
Author(s):  
Jan Van Schoot ◽  
Sjoerd Lok ◽  
Eelco van Setten ◽  
Ruben Maas ◽  
Kars Troost ◽  
...  
Keyword(s):  
Euv Lithography

Tomorrow’s pitches on today’s 0.33 NA scanner: pupil and imaging conditions to print P24 L/S and P28 contact holes

2021 ◽  
Author(s):  
Joern-Holger Franke ◽  
Natalia V. Davydova ◽  
Joost Bekaert ◽  
Vincent Wiaux ◽  
Vineet Vijayakrishnan Nair ◽  
...  
Keyword(s):  
Imaging Conditions

Stochastic printing behavior of non-local mask deficiencies in EUV lithography

2020 ◽  
Author(s):  
Rik Jonckheere ◽  
Lawrence S. Melvin
Keyword(s):  
Euv Lithography ◽  
Non Local

Multilayer optimization for high-NA EUV mask3D suppression

2020 ◽  
Author(s):  
Eelco van Setten ◽  
Katrina Rook ◽  
Hazem Mesilhy ◽  
Gerardo Bottiglieri ◽  
Frank Timmermans ◽  
...  

scholarly journals Image blur investigation using EUV-interference lithography

2020 ◽  
Author(s):  
Timothée Allenet ◽  
Jara G. Santaclara ◽  
Gijsbert Rispens ◽  
Bernd Geh ◽  
Yasin Ekinci
Keyword(s):  
Interference Lithography ◽  
Image Blur

High NA EUV scanner: obscuration and wavefront description

2020 ◽  
Author(s):  
Laurens de Winter ◽  
Timur Tudorovskiy ◽  
Jan van Schoot ◽  
Kars Troost ◽  
Erwin Stinstra ◽  
...  

Sub-nm depth characterization of EUV nanoscale photoresist films by standing-wave photoemission spectroscopy

2020 ◽  
Author(s):  
Giuseppina Conti ◽  
Henrique Perin Martins ◽  
Isvar A. Cordova ◽  
Jonathan Ma ◽  
Rudy J. Wojtecki ◽  
...  
Keyword(s):  
Standing Wave ◽  
Photoemission Spectroscopy

Study of EUV reticle storage effects through exposure on EBL2 and NXE

2020 ◽  
Author(s):  
Rik Jonckheere ◽  
Chien-Ching Wu ◽  
Veronique de Rooij-Lohmann ◽  
Dorus Elstgeest ◽  
Henk Lensen ◽  
...  
Keyword(s):  
Storage Effects

Fundamental understanding and experimental verification of bright versus dark field imaging

2020 ◽  
Author(s):  
Natalia V. Davydova ◽  
Jo Finders ◽  
John McNamara ◽  
Eelco van Setten ◽  
Claire van Lare ◽  
...  
Keyword(s):  
Experimental Verification ◽  
Dark Field ◽  
Dark Field Imaging ◽  
Fundamental Understanding ◽  
Field Imaging

Stitching enablement for anamorphic imaging: a ~1μm exclusion band and its implications

2020 ◽  
Author(s):  
Vincent Wiaux ◽  
Joost Bekaert ◽  
Tatiana Kovalevich ◽  
Julien Ryckaert ◽  
Eric Hendrickx ◽  
...  
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