Theoretical fabrication of subwavelength structures by surface plasmon interference based on complementary grating

This paper presents a surface plasmon interference lithography technique based on the complementary grating, which comprises silicon gratings and complementary aluminum grating masks, for fabricating subwavelength structures. In this theoretical study, the optimal parameters of the complementary grating structure were determined using the reflectance spectrum. The optical field distributions of one- and two-dimensional subwavelength structures were obtained using the finite-difference time-domain method and rotation-related formulas. The results of numerical evaluations show that a one-dimensional periodic structure with a half-pitch resolution of 60.5 nm (approximately [Formula: see text]/6.7) can be fabricated. In addition, subwavelength structures can be diversified using different rotation methods to expose the photolithography samples, such as square dot arrays and quasi-hexagonal closely packed structures. The proposed method combines surface plasmon interference with sample rotation, thereby enabling fabrication of abundant subwavelength structures.

Fabrication of Large Area, Ordered Nanoporous Structures on Various Substrates for Potential Electro-Optic Applications

Nanoporous structures have attracted great attention in electronics, sensor and storage devices, and photonics because of their large surface area, large volume to surface ratio, and potential for high-sensitivity sensor applications. Normally, electron or ion beam patterning can be used for nanopores fabrication by direct writing. However, direct writing is a rather expensive and time-consuming method due to its serial nature. Therefore, it may not translate to a preferred manufacturing process. In this research, a perfectly ordered large-area periodic pattern in an area of approximately 1 cm2 has been successfully fabricated on various substrates including glass, silicon, and polydimethylsiloxane, using a two-step process comprising visible light-based multibeam interference lithography and subsequent pattern transfer processes of reactive ion etching and nanomolding. Additionally, the multibeam interference lithography templated anodized aluminum oxide process has been described. Since the fabrication area in multibeam interference lithography can be extended by using a larger beam size, it is highly cost effective and manufacturable. Furthermore, although not described here, an electrodeposition process can be utilized as a pattern transfer process. This large-area perfectly ordered nanopore array will be very useful for high-density electronic memory and photonic bandgap and metamaterial applications.

Theoretical study of micro-structure fabrication by multi-beam laser interference lithography with different polarization combinations

In this study, we systematically and comprehensively investigated the influence of polarization angle on the fabrication of micro-structures by multi-beam laser interference lithography. Using theoretical analysis and simulation, we studied the effect of different polarization combinations, i.e. transverse electric (TE) and transverse magnetic (TM) polarization combinations, on the characteristics of the micro-structures fabricated by three-, four-, and six-beam laser interference lithography. We successfully obtained micro-structures with different periodic patterns such as honeycomb dots, quasi-elliptic dots, different square dots, and quasi-triangular dots. The simulation results illustrate that polarization affects the formation of interference patterns, pattern contrasts, and periods. The methods discussed herein are simple, low cost, and allow excellent control over structural parameters, and hence are useful for the micro-structure manufacturing industry.