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Advances in Patterning Materials and Processes XXXV
Latest Publications
TOTAL DOCUMENTS
53
(FIVE YEARS 0)
H-INDEX
2
(FIVE YEARS 0)
Published By SPIE
9781510616646, 9781510616653
Latest Documents
Most Cited Documents
Contributed Authors
Related Sources
Related Keywords
Latest Documents
Most Cited Documents
Contributed Authors
Related Sources
Related Keywords
Computational enablement for designs with sub-20nm metal tip to tip using cut shapes from grapho-epitaxy directed self-assembly
Advances in Patterning Materials and Processes XXXV
◽
10.1117/12.2297344
◽
2018
◽
Author(s):
Balint Meliorisz
◽
Ulrich Welling
◽
Hans-Jürgen Stock
◽
Sajan Marokkey
◽
Thomas Mülders
◽
...
Keyword(s):
Self Assembly
◽
Metal Tip
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Front Matter: Volume 10586
Advances in Patterning Materials and Processes XXXV
◽
10.1117/12.2323987
◽
2018
◽
Keyword(s):
Matter Volume
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Utilization of metal-polymer interactions for self-aligned directed self-assembly of device relevant features
Advances in Patterning Materials and Processes XXXV
◽
10.1117/12.2300859
◽
2018
◽
Cited By ~ 1
Author(s):
Moshe Dolejsi
◽
Paul F. Nealey
Keyword(s):
Self Assembly
◽
Polymer Interactions
◽
Metal Polymer
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Multi-color fly-cut-SAQP for reduced process variation
Advances in Patterning Materials and Processes XXXV
◽
10.1117/12.2303004
◽
2018
◽
Cited By ~ 1
Author(s):
Richard A. Farrell
◽
Elliott Franke
◽
Angelique Raley
◽
Akitero Ko
◽
Peter Biolsi
◽
...
Keyword(s):
Process Variation
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Polymer brush as adhesion promoter for EUV patterning
Advances in Patterning Materials and Processes XXXV
◽
10.1117/12.2297113
◽
2018
◽
Author(s):
Jing Guo
◽
Anuja De Silva
◽
Yann Mignot
◽
Yongan Xu
◽
Abraham Arceo de la Peña
◽
...
Keyword(s):
Polymer Brush
◽
Adhesion Promoter
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New spin on carbon materials made from hemicellulose for hardmask layer
Advances in Patterning Materials and Processes XXXV
◽
10.1117/12.2297333
◽
2018
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Author(s):
Kazuyo Morita
◽
Kimiko Yamamoto
◽
Masahiko Harumoto
◽
Yuji Tanaka
◽
Chisayo Nakayama
◽
...
Keyword(s):
Carbon Materials
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Aqueous developers for positive tone ultrathin chemically amplified EUV resists
Advances in Patterning Materials and Processes XXXV
◽
10.1117/12.2297380
◽
2018
◽
Cited By ~ 1
Author(s):
Bharat Kumar
◽
Dario L. Goldfarb
Keyword(s):
Chemically Amplified
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Investigating the effect of ionizing radiation on the acid concentration necessary for dissolution of chemically amplified EUV photoresists
Advances in Patterning Materials and Processes XXXV
◽
10.1117/12.2297386
◽
2018
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Cited By ~ 1
Author(s):
Steven Grzeskowiak
◽
Jake Kaminsky
◽
Jonathan Chandonait
◽
Greg H. Denbeaux
◽
Sean Gibbons
◽
...
Keyword(s):
Ionizing Radiation
◽
Acid Concentration
◽
Chemically Amplified
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EUV resist sensitization and roughness improvement by PSCAR with in-line flood exposure system (Conference Presentation)
Advances in Patterning Materials and Processes XXXV
◽
10.1117/12.2297498
◽
2018
◽
Cited By ~ 1
Author(s):
Michael Carcasi
◽
Tomoki Nagai
◽
Motoyuki Shima
◽
Toru Kimura
◽
Takehiko Naruoka
◽
...
Keyword(s):
Exposure System
◽
Flood Exposure
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Molecular organometallic resists for EUV (MORE): Reactivity as a function of metal center (Bi, Sb, Te and Sn)
Advances in Patterning Materials and Processes XXXV
◽
10.1117/12.2316333
◽
2018
◽
Cited By ~ 1
Author(s):
Jacob Sitterly
◽
Michael Murphy
◽
Steven Grzeskowiak
◽
Gregory Denbeaux
◽
Robert L. Brainard
Keyword(s):
Metal Center
Download Full-text
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