Science and Technology of Integrated Ferroelectrics
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54

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Published By CRC Press

9780429077760

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Review of SrBi[sub(2)]Ta[sub(2)][sub(0)]9 Thin Films Capacitor Processing

Science and Technology of Integrated Ferroelectrics ◽

10.1201/9781482283365-62 ◽

2001 ◽

pp. 717-734

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Voltage Scaling of Ferroelectric Thin Films Deposited by CVD

Science and Technology of Integrated Ferroelectrics ◽

10.1201/9781482283365-60 ◽

2001 ◽

pp. 683-700

Keyword(s):

Voltage Scaling ◽

Ferroelectric Thin Films

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Epitaxial BaTiO[sub(3)] Films on Silicon for MFSFET Applications

Science and Technology of Integrated Ferroelectrics ◽

10.1201/9781482283365-59 ◽

2001 ◽

pp. 673-682

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Conducting Diffusion Barriers for Integration of Ferroelectric Capacitors on Si

Science and Technology of Integrated Ferroelectrics ◽

10.1201/9781482283365-58 ◽

2001 ◽

pp. 655-672

Keyword(s):

Diffusion Barriers ◽

Ferroelectric Capacitors

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Thechnology Challenges and Solutions for Igibit and Beyond

Science and Technology of Integrated Ferroelectrics ◽

10.1201/9781482283365-52 ◽

2001 ◽

pp. 571-582

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The Bandgap of SrBi[sub(2)]Ta[sub(2)]O[sub(9)]

Science and Technology of Integrated Ferroelectrics ◽

10.1201/9781482283365-47 ◽

2001 ◽

pp. 529-536

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A Gbit-Scale Dram Stacked with ECR Mocvd SrTiO[sub(3)] Over rie Patterned u0[sub(2)]/TiN Storage Nodes

Science and Technology of Integrated Ferroelectrics ◽

10.1201/9781482283365-43 ◽

2001 ◽

pp. 479-498

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Plasma Etching of Plzt: Review and Future Prospects

Science and Technology of Integrated Ferroelectrics ◽

10.1201/9781482283365-32 ◽

2001 ◽

pp. 347-356

Keyword(s):

Plasma Etching ◽

Future Prospects

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A Thoery of Polarization Reversals in Finite Systems

Science and Technology of Integrated Ferroelectrics ◽

10.1201/9781482283365-28 ◽

2001 ◽

pp. 313-316

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Numerical Analaysis of Ferroelectric Characteristics for Memory Use by Using a Lattic Model

Science and Technology of Integrated Ferroelectrics ◽

10.1201/9781482283365-22 ◽

2001 ◽

pp. 235-244

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