2020 China Semiconductor Technology International Conference (CSTIC)
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9781728165585
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Impact of Bevel Condition on STI CMP Scratch

2020 ◽  
Author(s):  
Yuanyuan Meng ◽  
Lei Zhang ◽  
Yibin Li ◽  
Wei Zhang ◽  
Haifeng Zhou ◽  
...  

The Solution of AIO-ET Via Open and Process Window Improvement

2020 ◽  
Author(s):  
Baichun Zhang ◽  
Jianguo Yang ◽  
Lei Sun ◽  
Quanbo Li ◽  
Jun Huang ◽  
...  
Keyword(s):  
Process Window

Effect of Complexing Agent in Slurry on CMP Property for Barrier Material Cobalt

2020 ◽  
Author(s):  
Jinsong Zuo ◽  
Fang Wang ◽  
Kai Hu ◽  
Luguang Wang ◽  
Yujie Yuan ◽  
...  
Keyword(s):  
Complexing Agent ◽  
Barrier Material

Litho Process Optimization to Improve Overlay Measurement in Thick PR Layer

2020 ◽  
Author(s):  
Jiantao Wang ◽  
Jun Yu ◽  
Yuming Sun ◽  
Cong Zhang ◽  
Xiaobo Guo ◽  
...  
Keyword(s):  
Process Optimization

Monolithic 3D Enabled Processing-in- SRAM Memory

2020 ◽  
Author(s):  
Vijaykrishnan Narayanan ◽  
Nagadastagiri Challapalle ◽  
Ikenna Okafor ◽  
Srivatsa Srinivasa ◽  
Nicholas Jao
Keyword(s):  
Sram Memory

Narrow-Band Mask Synthesis with Semi-Implicit Difference

2020 ◽  
Author(s):  
Yijiang Shen ◽  
XiaoPeng Wang
Keyword(s):  
Narrow Band

Application of a Bevel Etch Process for Improving Particle Performance in CMOS Image Sensor Manufacture

2020 ◽  
Author(s):  
Yiling Sun ◽  
Jihong Zhang ◽  
Yu Jiang ◽  
Fulong Qiao ◽  
Keqiang He ◽  
...  
Keyword(s):  
Cmos Image Sensor ◽  
Image Sensor
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