35th European Mask and Lithography Conference (EMLC 2019)
Latest Publications

TOTAL DOCUMENTS

24
(FIVE YEARS 24)

H-INDEX

1
(FIVE YEARS 1)

Published By SPIE

9781510630673, 9781510630680
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Enhanced wafer overlay residuals control: deep sub-nanometer at sub-millimeter lateral resolution

2019 ◽  
Author(s):  
Yael Sufrin ◽  
Philippe Leray ◽  
Eren Canga ◽  
Avi Cohen ◽  
Vladimir Dmitriev ◽  
...  
Keyword(s):  
Lateral Resolution

Multi-beam technology for defect inspection of wafer and mask

2019 ◽  
Author(s):  
Weiming Ren ◽  
Xuedong Liu ◽  
Xuerang Hu ◽  
Xinan Luo ◽  
xiaoyu Ji ◽  
...  
Keyword(s):  
Defect Inspection

Haze and pellicle material selection for haze free

2019 ◽  
Author(s):  
Sangjin Cho ◽  
Byoungpil Lee ◽  
Ji Hyang Kim ◽  
Won Kyeong Song ◽  
Hungue Choi ◽  
...  
Keyword(s):  
Material Selection ◽  
Selection For

Dual platform stepper/scanner-based overlay evaluation method

2019 ◽  
Author(s):  
Philipp Kulse ◽  
Simone Jätzlau ◽  
Katrin Schulz ◽  
Matthias Wietstruck
Keyword(s):  
Evaluation Method

EUVL is being inserted in manufacturing in 2019: What are the mask related challenges remaining?

2019 ◽  
Author(s):  
Kurt G. Ronse ◽  
Rik Jonckheere ◽  
Emily Gallagher ◽  
Vicky Philipsen ◽  
Lieve Van Look ◽  
...  

Continuous challenges for next era of lithography

2019 ◽  
Author(s):  
Takahiro Hiromatsu ◽  
Ryo Ohkubo ◽  
Hitoshi Maeda ◽  
Toru Fukui ◽  
Hiroaki Shishido ◽  
...  
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