Advanced Microelectronics - Advanced Gate Stacks for High-Mobility Semiconductors
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Published By Springer Berlin Heidelberg

9783540714903, 9783540714910

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Modeling of Growth of High-κ Oxides on Semiconductors

Advanced Microelectronics - Advanced Gate Stacks for High-Mobility Semiconductors ◽

10.1007/978-3-540-71491-0_7 ◽

2007 ◽

pp. 165-179

Author(s):

C. J. Först ◽

C. A. Ashman ◽

K. Schwarz ◽

P. E. Blöchl

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A Theoretical View on the Dielectric Properties of Crystalline and Amorphous High-κ Materials and Films

Advanced Microelectronics - Advanced Gate Stacks for High-Mobility Semiconductors ◽

10.1007/978-3-540-71491-0_12 ◽

2007 ◽

pp. 269-292 ◽

Author(s):

V. Fiorentini ◽

P. Delugas ◽

A. Filippetti

Keyword(s):

Dielectric Properties ◽

Theoretical View

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Germanium Deep-Submicron p-FET and n-FET Devices, Fabricated on Germanium-On-Insulator Substrates

Advanced Microelectronics - Advanced Gate Stacks for High-Mobility Semiconductors ◽

10.1007/978-3-540-71491-0_15 ◽

2007 ◽

pp. 333-340 ◽

Author(s):

M. Meuris ◽

B. Jaeger ◽

J. Steenbergen ◽

R. Bonzom ◽

M. Caymax ◽

...

Keyword(s):

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Interface Engineering for High-κ Ge MOSFETs

Advanced Microelectronics - Advanced Gate Stacks for High-Mobility Semiconductors ◽

10.1007/978-3-540-71491-0_5 ◽

2007 ◽

pp. 115-138 ◽

Author(s):

S. J. Lee ◽

C. Zhu ◽

D. L. Kwong

Keyword(s):

Interface Engineering

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High Current Drivability MOSFET Fabricated on Si(110) Surface

Advanced Microelectronics - Advanced Gate Stacks for High-Mobility Semiconductors ◽

10.1007/978-3-540-71491-0_2 ◽

2007 ◽

pp. 21-41

Author(s):

A. Teramoto ◽

T. Ohmi

Keyword(s):

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Opportunities and Challenges of Germanium Channel MOSFETs

Advanced Microelectronics - Advanced Gate Stacks for High-Mobility Semiconductors ◽

10.1007/978-3-540-71491-0_14 ◽

2007 ◽

pp. 315-332 ◽

Author(s):

H. Shang ◽

E. P. Gusev ◽

M. M. Frank ◽

J. O. Chu ◽

S. Bedell ◽

...

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High κ Gate Dielectrics for Compound Semiconductors

Advanced Microelectronics - Advanced Gate Stacks for High-Mobility Semiconductors ◽

10.1007/978-3-540-71491-0_10 ◽

2007 ◽

pp. 229-256

Author(s):

J. Kwo ◽

M. Hong

Keyword(s):

Gate Dielectrics ◽

Compound Semiconductors

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Passivation and Characterization of Germanium Surfaces

Advanced Microelectronics - Advanced Gate Stacks for High-Mobility Semiconductors ◽

10.1007/978-3-540-71491-0_4 ◽

2007 ◽

pp. 73-113 ◽

Author(s):

S. R. Amy ◽

Y. J. Chabal

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Interface Properties of High-κ Dielectrics on Germanium

Advanced Microelectronics - Advanced Gate Stacks for High-Mobility Semiconductors ◽

10.1007/978-3-540-71491-0_11 ◽

2007 ◽

pp. 257-267 ◽

Author(s):

A. Toriumi ◽

K. Kita ◽

M. Toyama ◽

H. Nomura

Keyword(s):

Interface Properties

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Point Defects in Stacks of High-κ Metal Oxides on Ge: Contrast with the Si Case

Advanced Microelectronics - Advanced Gate Stacks for High-Mobility Semiconductors ◽

10.1007/978-3-540-71491-0_9 ◽

2007 ◽

pp. 211-228 ◽

Author(s):

A. Stesmans ◽

V. V. Afanas’ev

Keyword(s):

Metal Oxides ◽

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