Advances in Metrology for X-Ray and EUV Optics VIII
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9781510629110, 9781510629127
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Diffraction compensation of slope errors on strongly curved grating substrates

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Christoph Braig ◽  
Jürgen Probst ◽  
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Ilko Rahneberg ◽  
Michael Kühnel ◽  
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High-accuracy autocollimator calibration by interferometric 2D angle generator

2019 ◽  
Author(s):  
Ville Heikkinen ◽  
Ville Byman ◽  
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Ralf D. Geckeler ◽  
Andreas Just ◽  
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High Accuracy

scholarly journals Collaborative development of diffraction-limited beamline optical systems at US DOE light sources

2019 ◽  
Author(s):  
Kenneth A. Goldberg ◽  
Antoine Wojdyla ◽  
Diane Bryant ◽  
Weilun Chao ◽  
Daniele Cocco ◽  
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Keyword(s):  
Optical Systems ◽  
Light Sources ◽  
Collaborative Development

Stitching interferometry for synchrotron mirror metrology at NSLS-II (Conference Presentation)

2019 ◽  
Author(s):  
Lei Huang ◽  
Tianyi Wang ◽  
Kashmira Tayabaly ◽  
Mourad Idir

The in-situ LTP window glass optomechanical analysis

2019 ◽  
Author(s):  
Ming-Ying Hsu ◽  
Gung-Chian Yin ◽  
Chien-yu Lee ◽  
Bo-Yi Chen ◽  
Hok-Sum Fung ◽  
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Window Glass

EUV Stokes reflection polarimeter using gold coated mirrors for use up to 150 eV photon energy

2019 ◽  
Author(s):  
Gillian Black ◽  
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Feizhu He ◽  
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Keyword(s):  
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