Novel non‐chemically amplified resist utilizing interaction between hexafluoroisopropylalcohol‐containing styrene and photochemical acid generator

2020 ◽  
Vol 58 (8) ◽  
pp. 1062-1068
Author(s):  
Takashi Doi ◽  
Yuji Yada ◽  
Kota Nishino ◽  
Makoto Sugiura ◽  
Tsutomu Shimokawa
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resist

Chemically amplified resist technology for i-line applications

1998 ◽  
Author(s):  
Medhat A. Toukhy ◽  
Sanjay Malik ◽  
Andrew J. Blakeney ◽  
Karin R. Schlicht
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resist

Sub-150-nm electron-beam lithography using AZPN114 chemically amplified resist

1997 ◽  
Author(s):  
Zheng Cui ◽  
R. A. Moody ◽  
Ian M. Loader ◽  
John G. Watson ◽  
Philip D. Prewett
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Chemically Amplified ◽  
Chemically Amplified Resist

Postexposure Delay Effect on Linewidth Variation in Base Added Chemically Amplified Resist

2000 ◽  
Vol 147 (10) ◽  
pp. 3833 ◽  
Author(s):  
Chin-Yu Ku ◽  
Jia-Min Shieh ◽  
Tsann-Bim Chiou ◽  
Hwang-Kuen Lin ◽  
Tan Fu Lei
Keyword(s):  
Delay Effect ◽  
Chemically Amplified ◽  
Chemically Amplified Resist

Airborne Contamination of a Chemically Amplified Resist. 2. Effect of Polymer Film Properties on Contamination Rate

1994 ◽  
Vol 6 (4) ◽  
pp. 481-488 ◽  
Author(s):  
William D. Hinsberg ◽  
Scott A. MacDonald ◽  
Nicholas J. Clecak ◽  
Clinton D. Snyder
Keyword(s):  
Polymer Film ◽  
Contamination Rate ◽  
Film Properties ◽  
Chemically Amplified ◽  
Airborne Contamination ◽  
Chemically Amplified Resist

Track oriented chemically-amplified resist processes for quarter-micron lithography

1993 ◽  
Author(s):  
Michael T. Reilly ◽  
Azalia A. Krasnoperova ◽  
Quinn J. Leonard ◽  
James W. Taylor ◽  
Shaowie Pan
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resist
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