Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

2009 ◽

Vol 27 (3) ◽

pp. 1272 ◽

Cited By ~ 9

Author(s):

S. W. Gan ◽

M. Rahman ◽

H. S. Lim

Keyword(s):

Monitoring System ◽

Force Monitoring

Download Full-text

Work function of W(100) field emitter modified with lutetium oxide and measured with photoemission electron microscope

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.3058726 ◽

2009 ◽

Vol 27 (2) ◽

pp. 719 ◽

Cited By ~ 7

Author(s):

Hideaki Nakane ◽

Yusuke Nakano ◽

Takashi Kawakubo

Keyword(s):

Electron Microscope ◽

Work Function ◽

Field Emitter ◽

Lutetium Oxide ◽

Photoemission Electron

Download Full-text

Effects of exposure time on defects and demolding force in soft ultraviolet nanoimprint lithography

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.3186611 ◽

2009 ◽

Vol 27 (5) ◽

pp. 2091 ◽

Cited By ~ 15

Author(s):

Xiangdong Ye ◽

Yucheng Ding ◽

Yugang Duan ◽

Hongzhong Liu ◽

Bingheng Lu

Keyword(s):

Exposure Time ◽

Nanoimprint Lithography

Download Full-text

Influence of the electrode material on HfO[sub 2] metal-insulator-metal capacitors

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.3071843 ◽

2009 ◽

Vol 27 (1) ◽

pp. 286 ◽

Cited By ~ 24

Author(s):

Ch. Wenger ◽

M. Lukosius ◽

H.-J. Müssig ◽

G. Ruhl ◽

S. Pasko ◽

...

Keyword(s):

Electrode Material ◽

Metal Insulator ◽

Metal Insulator Metal

Download Full-text

Negative tone molecular resists using cationic polymerization: Comparison of epoxide and oxetane functional groups

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.3264672 ◽

2009 ◽

Vol 27 (6) ◽

pp. 2998 ◽

Cited By ~ 12

Author(s):

Richard A. Lawson ◽

David E. Noga ◽

Todd R. Younkin ◽

Laren M. Tolbert ◽

Clifford L. Henderson

Keyword(s):

Functional Groups ◽

Cationic Polymerization ◽

Negative Tone

Download Full-text

Plasma reactor dry cleaning strategy after TaC, MoN, WSi, W, and WN etching processes

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.3058710 ◽

2009 ◽

Vol 27 (1) ◽

pp. 113 ◽

Cited By ~ 5

Author(s):

R. Ramos ◽

G. Cunge ◽

O. Joubert ◽

T. Lill

Keyword(s):

Plasma Reactor ◽

Dry Cleaning

Download Full-text

Control of the critical dimensions and line edge roughness with pre-organized block copolymer pixelated photoresists

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.3256632 ◽

2009 ◽

Vol 27 (6) ◽

pp. 2993 ◽

Cited By ~ 5

Author(s):

Huiman Kang ◽

Yun Jun Kim ◽

Padma Gopalan ◽

Paul F. Nealey

Keyword(s):

Block Copolymer ◽

Line Edge Roughness ◽

Critical Dimensions ◽

Edge Roughness

Download Full-text

ZnO nanorod arrays on n-type Si(111) substrates for pH measurements

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.3098503 ◽

2009 ◽

Vol 27 (3) ◽

pp. 1684 ◽

Cited By ~ 3

Author(s):

Ken-ichi Ogata ◽

Kazuto Koike ◽

Shigehiko Sasa ◽

Masataka Inoue ◽

Mitsuaki Yano

Keyword(s):

Zno Nanorod ◽

Nanorod Arrays ◽

Zno Nanorod Arrays ◽

Ph Measurements

Download Full-text

Development of microfluidic device and system for breast cancer cell fluorescence detection

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.3049529 ◽

2009 ◽

Vol 27 (3) ◽

pp. 1295 ◽

Cited By ~ 2

Author(s):

J. H. He ◽

J. Reboud ◽

H. M. Ji ◽

C. Lee ◽

Y. Long

Keyword(s):

Breast Cancer ◽

Cancer Cell ◽

Breast Cancer Cell ◽

Microfluidic Device ◽

Fluorescence Detection

Download Full-text

Strong exciton-photon coupling in ZnO based resonators

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.3086661 ◽

2009 ◽

Vol 27 (3) ◽

pp. 1726 ◽

Cited By ~ 9

Author(s):

C. Sturm ◽

H. Hilmer ◽

R. Schmidt-Grund ◽

C. Czekalla ◽

J. Sellmann ◽

...

Keyword(s):

Photon Coupling

Download Full-text

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
Latest Publications

TOTAL DOCUMENTS

H-INDEX

Published By American Vacuum Society

Development of a fine tool servo with force monitoring system for nanomachining applications

Work function of W(100) field emitter modified with lutetium oxide and measured with photoemission electron microscope

Effects of exposure time on defects and demolding force in soft ultraviolet nanoimprint lithography

Influence of the electrode material on HfO[sub 2] metal-insulator-metal capacitors

Negative tone molecular resists using cationic polymerization: Comparison of epoxide and oxetane functional groups

Plasma reactor dry cleaning strategy after TaC, MoN, WSi, W, and WN etching processes

Control of the critical dimensions and line edge roughness with pre-organized block copolymer pixelated photoresists

ZnO nanorod arrays on n-type Si(111) substrates for pH measurements

Development of microfluidic device and system for breast cancer cell fluorescence detection

Strong exciton-photon coupling in ZnO based resonators

Export Citation Format

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and PhenomenaLatest Publications

TOTAL DOCUMENTS

H-INDEX

Published By American Vacuum Society

Development of a fine tool servo with force monitoring system for nanomachining applications

Work function of W(100) field emitter modified with lutetium oxide and measured with photoemission electron microscope

Effects of exposure time on defects and demolding force in soft ultraviolet nanoimprint lithography

Influence of the electrode material on HfO[sub 2] metal-insulator-metal capacitors

Negative tone molecular resists using cationic polymerization: Comparison of epoxide and oxetane functional groups

Plasma reactor dry cleaning strategy after TaC, MoN, WSi, W, and WN etching processes

Control of the critical dimensions and line edge roughness with pre-organized block copolymer pixelated photoresists

ZnO nanorod arrays on n-type Si(111) substrates for pH measurements

Development of microfluidic device and system for breast cancer cell fluorescence detection

Strong exciton-photon coupling in ZnO based resonators

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
Latest Publications