Three-component negative-type photosensitive polyimide precursor based on poly(amic acid), a crosslinker, and a photoacid generator

Journal of Polymer Science Part A Polymer Chemistry ◽

10.1002/pola.20554 ◽

2004 ◽

Vol 43 (3) ◽

pp. 593-599 ◽

Author(s):

Yasufumi Watanabe ◽

Ken-ichi Fukukawa ◽

Yuji Shibasaki ◽

Mitsuru Ueda

Keyword(s):

Amic Acid ◽

Negative Type ◽

Polyimide Precursor ◽

Photoacid Generator

Download Full-text

New Negative-type Photosensitive Alkaline-developable Semi-aromatic Polyimides with Low Dielectric Constants Based on Poly(amic acid) from Aromatic Diamine Containing Adamantyl Units and Alicyclic Dianhydrides, A Cross-linker, and A Photoacid Generator

Polymer Journal ◽

10.1295/polymj.37.270 ◽

2005 ◽

Vol 37 (4) ◽

pp. 270-276 ◽

Author(s):

Yasufumi Watanabe ◽

Yuji Shibasaki ◽

Shinji Ando ◽

Mitsuru Ueda

Keyword(s):

Amic Acid ◽

Dielectric Constants ◽

Aromatic Diamine ◽

Aromatic Polyimides ◽

Negative Type ◽

Low Dielectric ◽

Cross Linker ◽

Photoacid Generator

Download Full-text

Positive-Working Photosensitive Alkaline-Developable Polyimide Precursor Based on Semi-Alicyclic Poly(amide acid), Vinyl Ether Crosslinker, and a Photoacid Generator

Journal of Photopolymer Science and Technology ◽

10.2494/photopolymer.19.277 ◽

2006 ◽

Vol 19 (2) ◽

pp. 277-280 ◽

Author(s):

Masaki Okazaki ◽

Hitoshi Onishi ◽

Wataru Yamashita ◽

Shoji Tamai

Keyword(s):

Vinyl Ether ◽

Polyimide Precursor ◽

Photoacid Generator

Download Full-text

A New Negative-Type Photosensitive Polymer Based on Poly (2,6-dihydroxy-1,5-naphthalene), a Cross-Linker, and a Photoacid Generator

Journal of Photopolymer Science and Technology ◽

10.2494/photopolymer.16.285 ◽

2003 ◽

Vol 16 (2) ◽

pp. 285-286

Author(s):

Kousuke Tsuchiya ◽

Yuji Shibasaki ◽

Masato Suzuki ◽

Mitsuru Ueda

Keyword(s):

Negative Type ◽

Photosensitive Polymer ◽

Cross Linker ◽

Photoacid Generator

Download Full-text

Novel Partial Esterification Reaction in Poly(amic acid) and Its Application for Positive-Tone Photosensitive Polyimide Precursor

Polymer Journal ◽

10.1295/polymj.pj2008333 ◽

2009 ◽

Vol 41 (8) ◽

pp. 604-608 ◽

Author(s):

Masao Tomikawa ◽

Satoshi Yoshida ◽

Naoyo Okamoto

Keyword(s):

Amic Acid ◽

Esterification Reaction ◽

Polyimide Precursor

Download Full-text

A New Positive-Type Photosensitive Alkaline-Developable Alicyclic Polyimide Based on Poly(amic acid silylester) as a Polyimide Precursor and Diazonaphthoquinone as a Photosensitive Compound

Chemistry of Materials ◽

10.1021/cm0115362 ◽

2002 ◽

Vol 14 (4) ◽

pp. 1762-1766 ◽

Author(s):

Yasufumi Watanabe ◽

Yuji Shibasaki ◽

Shinji Ando ◽

Mitsuru Ueda

Keyword(s):

Amic Acid ◽

Positive Type ◽

Polyimide Precursor

Download Full-text

Positive-Working Alkaline-Developable Photosensitive Polyimide Precursor Based on Poly(amic acid) and Dissolution Inhibitor.

Journal of Photopolymer Science and Technology ◽

10.2494/photopolymer.10.55 ◽

1997 ◽

Vol 10 (1) ◽

pp. 55-60 ◽

Author(s):

Osamu Haba ◽

Masaki Okazaki ◽

Tomonari Nakayama ◽

Mitsuru Ueda

Keyword(s):

Amic Acid ◽

Polyimide Precursor

Download Full-text

A positive-working photosensitive alkaline-developable polyimide with a highly dimensional stability and low dielectric constant based on poly(amic acid) as a polyimide precursor and diazonaphthoquinone as a photosensitive compound

Journal of Polymer Science Part A Polymer Chemistry ◽

10.1002/(sici)1099-0518(199812)36:17<3197::aid-pola23>3.0.co;2-3 ◽

1998 ◽

Vol 36 (17) ◽

pp. 3197-3197 ◽

Author(s):

H. Seino ◽

A. Mochizuki ◽

O. Haba ◽

M. Ueda

Keyword(s):

Dielectric Constant ◽

Dimensional Stability ◽

Amic Acid ◽

Low Dielectric Constant ◽

Low Dielectric ◽

Polyimide Precursor

Download Full-text

A Negative Type Photosensitive Polymer Based on Poly(naphthylene ether), a Cross-Linker, and a Photoacid Generator with Low Dielectric Constant

Polymer Journal ◽

10.1295/polymj.pj2006213 ◽

2007 ◽

Vol 39 (5) ◽

pp. 442-447 ◽

Author(s):

Kousuke Tsuchiya ◽

Yuji Shibasaki ◽

Mitsuru Ueda

Keyword(s):

Dielectric Constant ◽

Low Dielectric Constant ◽

Negative Type ◽

Low Dielectric ◽

Photosensitive Polymer ◽

Cross Linker ◽

Photoacid Generator

Download Full-text

Low‐temperature curable, alkaline‐developable, and negative‐type photosensitive polyimide with high resolution and mechanical properties based on chain extendable poly(amic acid) and photo‐base generator

Polymers for Advanced Technologies ◽

10.1002/pat.5119 ◽

2020 ◽

Author(s):

Yao‐Ming Yeh ◽

Vamsi K. Karapala ◽

Mitsuru Ueda ◽

Chain‐Shu Hsu

Keyword(s):

Mechanical Properties ◽

High Resolution ◽

Low Temperature ◽

Amic Acid ◽

Download Full-text

Three-Component Negative-Type Photoresist Based on Calix[4]resorcinarene, a Cross-linker, and a Photoacid Generator

Chemistry of Materials ◽

10.1021/cm980166n ◽

1998 ◽

Vol 10 (8) ◽

pp. 2230-2234 ◽

Author(s):

Mitsuru Ueda ◽

Daisuke Takahashi ◽

Tomonari Nakayama ◽

Osamu Haba

Keyword(s):

Negative Type ◽

Cross Linker ◽

Photoacid Generator

Download Full-text