Theory of Optical Bistability in Nonlinear Media for Slowly Varying Incident Intensity

1984 ◽  
pp. 463-469
Author(s):  
Y. B. Band
Keyword(s):  
Optical Bistability ◽  
Incident Intensity ◽  
Nonlinear Media

scholarly journals A Model of Optical Bistability and Polarisation Evolution in Birefringent χ(2)Nonlinear Media

1999 ◽  
Vol 96 (3-4) ◽  
pp. 373-381 ◽  
Author(s):  
W. Jęda ◽  
A. Zagórski
Keyword(s):  
Optical Bistability ◽  
Nonlinear Media

scholarly journals Tunable Optical Bistability, Tristability and Multistability in Arrays of Graphene

2020 ◽  
Vol 10 (17) ◽  
pp. 5766
Author(s):  
Xiuju Zhao ◽  
Bin Xu ◽  
Xiangna Kong ◽  
Dong Zhong ◽  
Ming Fang ◽  
...  
Keyword(s):  
Optical Bistability ◽  
Chemical Potential ◽  
Incident Light ◽  
Logic Gates ◽  
Optical Switches ◽  
Optical Logic ◽  
Incident Intensity ◽  
Incident Wavelength ◽  
All Optical ◽  
Potential Applications

The optical bistability, tristability and multistability are explored in arrays of graphene. The arrays are periodically arranged spatially by single sheets of graphene. Optical bistability could be achieved with a strong enough incident intensity of light wave. The thresholds of optical bistability and the intervals between the upper and lower thresholds change with the surface conductivity of graphene and the incident wavelength. By increasing the intensity of incident light, tristability and multistability can be induced as well. Furthermore, the thresholds of bistability, tristability and multistability can be regulated via the chemical potential of graphene. This study may have potential applications in optical logic gates, all-optical switches and photomemory.

scholarly journals Optical bistability in subwavelength slit apertures containing nonlinear media

2004 ◽  
Vol 70 (8) ◽  
Author(s):  
J. A. Porto ◽  
L. Martín-Moreno ◽  
F. J. García-Vidal
Keyword(s):  
Optical Bistability ◽  
Nonlinear Media ◽  
Subwavelength Slit

Intrinsic Optical Bistability in Nonlinear Media

1984 ◽  
Vol 53 (9) ◽  
pp. 910-913 ◽  
Author(s):  
J. A. Goldstone ◽  
E. Garmire
Keyword(s):  
Optical Bistability ◽  
Nonlinear Media ◽  
Intrinsic Optical Bistability

Optical bistability in nonlinear media: An exact method of calculation

1984 ◽  
Vol 56 (3) ◽  
pp. 656-659 ◽  
Author(s):  
Y. B. Band
Keyword(s):  
Optical Bistability ◽  
Exact Method ◽  
Nonlinear Media ◽  
Method Of Calculation

scholarly journals OPTICAL BISTABILITY IN A GRATING WITH SLITS FILLED NONLINEAR MEDIA

2014 ◽  
Vol 35 ◽  
pp. 133-139 ◽  
Author(s):  
Lyudmila A. Kochetova ◽  
Sergey L. Prosvirnin ◽  
Vladimir R. Tuz
Keyword(s):  
Optical Bistability ◽  
Nonlinear Media

The Possibilities for Analytical Methods in Photoemission and Low-Energy Electron Microscopy

1990 ◽  
Vol 48 (1) ◽  
pp. 348-349
Author(s):  
Ernst Bauer
Keyword(s):  
Chemical Characterization ◽  
Emission Angle ◽  
Relative Energy ◽  
Objective Lens ◽  
Chemical Information ◽  
Magnetic Lens ◽  
Incident Intensity ◽  
X Ray ◽  
Leed Pattern ◽  
Image Position

One of the major shortcomings of conventional PEEM and of LEEM is the lack of chemical information about the surface. Although the imaging of the LEED pattern in the back focal plane of the objective lens of a LEEM instrument allows chemical characterization via the crystalline structure derived from the LEED pattern, this method fails in the absence of a characteristic LEED pattern. Direct information about the atomic composition of the surface is then needed which can be best obtained from inner shell electrons either directly by x-ray-induced photoemission (XPEEM) or by x-ray- or electron-induced Auger electron emission (AEEM). These modes of excitation and imaging can be combined with conventional PEEM and LEEM in one instrument which is presently being developed. Thus a complete structural and chemical characterization becomes possible in one instrument, with parallel detection and high resolution.In contrast to LEEM, in which up to more than 50% of the incident intensity is available for image formation, the intensity of the emitted electrons is much lower in XPEEM and AEEM and the signal is much lower than the background in AEEM. Therefore, intensity I and resolution d have to be optimized simultaneously which is best done by maximizing Q = I/d2 with respect to maximum emission angle α and relative energy distribution ε = ΔVo/V accepted by the instrument. For a well-designed magnetic lens section of the cathode lens its aberrations are determined by the accelerating field F in front of the specimen. For a homogeneous accelerating field F and a cosine emission distribution one obtains for the optimum α and ε values αo,εo a radius of the minimum disc of confusion of

Quantum theory of light in nonlinear media with dispersion and absorption

1998 ◽  
Vol 45 (2) ◽  
pp. 377-402 ◽  
Author(s):  
EDUARD SCHMIDT , JOHN JEFFERS , STEPHEN M.
Keyword(s):  
Quantum Theory ◽  
Nonlinear Media

ELECTRONIC OPTICAL BISTABILITY IN A GaAs/AlGaAs STRIP-LOADED WAVEGUIDE

1988 ◽  
Vol 49 (C2) ◽  
pp. C2-305-C2-306
Author(s):  
H. M. GIBBS ◽  
M. WARREN ◽  
W. GIBBONS ◽  
K. KOMATSU ◽  
D. SARID ◽  
...  
Keyword(s):  
Optical Bistability

OPTICAL BISTABILITY IN MOLECULAR BEAM DEPOSITED ZnSe/BaF2 MULTILAYER INTERFERENCE FILTERS

1988 ◽  
Vol 49 (C2) ◽  
pp. C2-105-C2-108
Author(s):  
A. MILLER ◽  
I. T. MUIRHEAD ◽  
K. L. LEWIS ◽  
J. STAROMLYNSKA ◽  
K. R. WELFORD
Keyword(s):  
Optical Bistability ◽  
Molecular Beam ◽  
Interference Filters
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