The effect of post-process annealing on optical and electrical properties of mixed HfO2–TiO2 thin film coatings
2019 ◽
Vol 30
(7)
◽
pp. 6358-6369
Agata Obstarczyk
◽
Danuta Kaczmarek
◽
Michal Mazur
◽
Damian Wojcieszak
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Jaroslaw Domaradzki
◽
...
2019 ◽
Vol 175
◽
pp. 107822
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A. Obstarczyk
◽
D. Kaczmarek
◽
D. Wojcieszak
◽
M. Mazur
◽
J. Domaradzki
◽
...
2019 ◽
Vol 653
◽
pp. 012018
Maya Devi
◽
M.R. Panigrahi
2018 ◽
Vol 25
(6)
◽
pp. 2893-2902
◽
D. M. Sampaio
◽
R. Suresh Babu
◽
H. R. M. Costa
◽
A. L. F. de Barros
2020 ◽
Vol 30
(4)
◽
pp. 211-216
Ji-Min Park
◽
Hyoung-Do Kim
◽
Seong Cheol Jang
◽
Hyun-Suk Kim
2008 ◽
Vol 24
(3)
◽
pp. 714-719
◽
X. Tong
◽
A. Trivedi
◽
H. Jia
◽
M. Zhang
◽
P. Wang
Hamid Latif
◽
J. Liu
◽
D. Mo
◽
Rui Wang
◽
J. Zeng
◽
...
Thilo Sandner
◽
Jan Uwe Schmidt
◽
Harald Schenk
◽
Hubert Lakner
◽
Minghong Yang
◽
...
2014 ◽
Vol 115
(23)
◽
pp. 233514
◽
Rong Long
◽
Martin L. Dunn
Benjamin Hudson Baby
◽
Amrutha E. G.
◽
D. Bharathi Mohan