Development of ScSZ Electrolyte by Very Low Pressure Plasma Spraying for High-Performance Metal-Supported SOFCs

2019 ◽  
Vol 29 (1-2) ◽  
pp. 223-231 ◽  
Author(s):  
Yue-peng Wang ◽  
Jiu-tao Gao ◽  
Wei Chen ◽  
Cheng-xin Li ◽  
Shan-lin Zhang ◽  
...  
1994 ◽  
Vol 186 (1-2) ◽  
pp. 105-112 ◽  
Author(s):  
Kenji Murakami ◽  
Yoshitaka Fujii ◽  
Hiroshi Matsumoto ◽  
Tsuyoshi Irisawa ◽  
Taira Okamoto ◽  
...  

1997 ◽  
Vol 46 (12) ◽  
pp. 1436-1441
Author(s):  
Hidekazu TAKIZAWA ◽  
Keisuke YONEHAMA ◽  
Koh-ichi SUGIMOTO ◽  
Mitsuyuki KOBAYASHI

Wear ◽  
2015 ◽  
Vol 328-329 ◽  
pp. 369-377 ◽  
Author(s):  
Martin Bitzer ◽  
Nadine Rauhut ◽  
Georg Mauer ◽  
Martin Bram ◽  
Robert Vaßen ◽  
...  

1987 ◽  
Vol 99 ◽  
Author(s):  
K. Tachikawa ◽  
I. Watanabe ◽  
S. Kosuge

ABSTRACTA low pressure plasma spraying technique for depositing high-Tc YBCO thick films has been developed. Films with thickness ranging 20–100 μm have been prepared using Y0.3Ba0.7CuOx powders. After post-annealing in oxygen for 1h at 930–950°C, the films, which were deposited on nimonic alloy substrate heated at 650°C during spraying, exhibited a zero resistance temperature of 90.6K with transition width (90%-10%) of 2K and a critical current density (77K, 0T) of 690 A/cm2.


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