Surface structure determination of Sn deposited on Pt(111) by low energy alkali ion scattering

1991 ◽  
Vol 254 (1-3) ◽  
pp. 45-57 ◽  
Author(s):  
S.H. Overbury ◽  
D.R. Mullins ◽  
M.T. Paffett ◽  
B.E. Koel
1991 ◽  
Vol 254 (1-3) ◽  
pp. A474 ◽  
Author(s):  
S.H. Overbury ◽  
D.R. Mullins ◽  
M.T. Paffett ◽  
B.E. Koel

1990 ◽  
Vol 202 ◽  
Author(s):  
J. Vrijmoeth ◽  
P.M. Zagwijn ◽  
J.W.M. Frenken ◽  
J.F. van der Veen

ABSTRACTThe surface structure of epitaxial NiSi2 films grown on Si (111) has been determined using a new method. The backscattering signals from subsequent Ni layers in the NiSi2 (111) surface are resolved.The topology of the NiSi2 (111) surface is concluded to be bulklike, i.e., it is terminated by a Si – Ni – Si triple layer.


1990 ◽  
Vol 208 ◽  
Author(s):  
J. Vrijmoeth ◽  
P. M. Zagwijn ◽  
J. W. M. Frenken ◽  
J. F. Van Der Veen

ABSTRACTThe surface structure of epitaxial Nisi2 films grown on Si(111) has been determined using a new method. The backscattering signals from subsequent Ni layers in the Nisi2 (111) surface are resolved.The topology of the Nisi2(111) surface is concluded to be bulklike, i.e., it is terminated by a Si – Ni – Si triple layer.


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