Microprobe technique for determining the thickness of SiO2 and Si3N4 ultra-thin film composites of fet wafers and devices
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2008 ◽
Vol 24
(4)
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pp. 945-950
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2017 ◽
Vol 540
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pp. 391-400
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2002 ◽
Vol 82
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pp. 3087-3117
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1995 ◽
Vol 5
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pp. 1218-1221
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Vol 44
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pp. 495306
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