Molecular dynamics simulations on the effect of energy deposition rate on the electrical explosion of metal nanowires

2019 ◽  
Vol 162 ◽  
pp. 88-95 ◽  
Author(s):  
Fangwei Lv ◽  
Pingan Liu ◽  
Hui Qi ◽  
Junpeng Liu
1996 ◽  
Vol 440 ◽  
Author(s):  
C.R. Laurens ◽  
M.F Roşu ◽  
F. Pleiter ◽  
L. Niesen

AbstractWe deposited low-energy 111 atoms on a vicinal Cu(100) surface at 82K, and measured the atomic sites by means of the perturbed angular correlations technique (PAC). The sites of the as-deposited In atoms were determined for deposition energies ranging from 5 to 100 eV. The results are coinpared to Molecular Dynamics simulations of the deposition process.


Author(s):  
M.J. Caturla ◽  
A. Gras Martı́ ◽  
J.J. Jiménez-Rodrı́guez ◽  
J.-C. Jiménez Saez ◽  
M.-C. Pérez-Martı́n

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