Synchrotron radiation induced total reflection X-ray fluorescence of low Z elements on Si wafer surfaces at SSRL — comparison of excitation geometries and conditions

2001 ◽  
Vol 56 (11) ◽  
pp. 2085-2094 ◽  
Author(s):  
C Streli ◽  
P Wobrauschek ◽  
P Kregsamer ◽  
G Pepponi ◽  
P Pianetta ◽  
...  
Keyword(s):  
Synchrotron Radiation ◽  
Total Reflection ◽  
X Ray ◽  
Radiation Induced ◽  
Wafer Surfaces ◽  
Si Wafer

Analysis of Ni on Si-wafer surfaces using synchrotron radiation excited total reflection X-ray fluorescence analysis

1997 ◽  
Vol 52 (7) ◽  
pp. 901-906 ◽  
Author(s):  
P. Wobrauschek ◽  
R. Görgl ◽  
P. Kregsamer ◽  
Ch. Streli ◽  
S. Pahlke ◽  
...  
Keyword(s):  
Synchrotron Radiation ◽  
Fluorescence Analysis ◽  
Total Reflection ◽  
X Ray ◽  
Wafer Surfaces ◽  
Si Wafer

scholarly journals Recent results of synchrotron radiation induced total reflection X-ray fluorescence analysis at HASYLAB, beamline L

2006 ◽  
Vol 61 (10-11) ◽  
pp. 1129-1134 ◽  
Author(s):  
C. Streli ◽  
G. Pepponi ◽  
P. Wobrauschek ◽  
C. Jokubonis ◽  
G. Falkenberg ◽  
...  
Keyword(s):  
Synchrotron Radiation ◽  
Fluorescence Analysis ◽  
Total Reflection ◽  
X Ray ◽  
Radiation Induced

Background spectrum of synchrotron radiation-excited total reflection x-ray fluorescence for Si wafer analysis

2001 ◽  
Vol 30 (2) ◽  
pp. 127-131
Author(s):  
N. S. Shin ◽  
C. H. Chang ◽  
Y. M. Koo ◽  
H. Padmore
Keyword(s):  
Synchrotron Radiation ◽  
Total Reflection ◽  
Background Spectrum ◽  
X Ray ◽  
Si Wafer
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