Synchrotron Radiation Total Reflection X-ray Fluorescence Spectroscopy for Microcontamination Analysis on Silicon Wafer Surfaces

Mapping Intimacies ◽

10.2172/784854 ◽

1997 ◽

Author(s):

Norikatsu Takaura

Keyword(s):

Synchrotron Radiation ◽

Fluorescence Spectroscopy ◽

Silicon Wafer ◽

Total Reflection ◽

X Ray ◽

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Total reflection X-ray fluorescence spectroscopy using synchrotron radiation for trace impurity analysis of silicon wafer surfaces

Metals and Materials ◽

10.1007/bf03025943 ◽

1996 ◽

Vol 2 (1) ◽

pp. 23-29

Author(s):

C. H. Chang ◽

Y. M. Koo ◽

H. Padmore

Keyword(s):

Synchrotron Radiation ◽

Fluorescence Spectroscopy ◽

Silicon Wafer ◽

Total Reflection ◽

Trace Impurity ◽

X Ray ◽

Impurity Analysis ◽

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Determination of ultra trace contaminants on silicon wafer surfaces using total-reflection X-ray fluorescence TXRF ‘state-of-the-art’

Spectrochimica Acta Part B Atomic Spectroscopy ◽

10.1016/s0584-8547(01)00312-3 ◽

2001 ◽

Vol 56 (11) ◽

pp. 2261-2274 ◽

Author(s):

S Pahlke ◽

L Fabry ◽

L Kotz ◽

C Mantler ◽

T Ehmann

Keyword(s):

Silicon Wafer ◽

State Of The Art ◽

Total Reflection ◽

X Ray ◽

Trace Contaminants ◽

Ultra Trace ◽

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Synchrotron radiation induced total reflection X-ray fluorescence of low Z elements on Si wafer surfaces at SSRL — comparison of excitation geometries and conditions

Spectrochimica Acta Part B Atomic Spectroscopy ◽

10.1016/s0584-8547(01)00322-6 ◽

2001 ◽

Vol 56 (11) ◽

pp. 2085-2094 ◽

Author(s):

C Streli ◽

P Wobrauschek ◽

P Kregsamer ◽

G Pepponi ◽

P Pianetta ◽

...

Keyword(s):

Synchrotron Radiation ◽

Total Reflection ◽

X Ray ◽

Radiation Induced ◽

Wafer Surfaces ◽

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High-Sensitivity Total Reflection X-Ray Fluorescence Spectroscopy of Silicon Wafers Using Synchrotron Radiation.

Analytical Sciences ◽

10.2116/analsci.11.515 ◽

1995 ◽

Vol 11 (3) ◽

pp. 515-518 ◽

Author(s):

Stephen S. LADERMAN ◽

Alice Fischer-COLBRIE ◽

Ayako SHIMAZAKI ◽

Kunihiro MIYAZAKI ◽

Sean BRENNAN ◽

...

Keyword(s):

Synchrotron Radiation ◽

Fluorescence Spectroscopy ◽

High Sensitivity ◽

Silicon Wafers ◽

Total Reflection ◽

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Improvement of total reflection X-ray fluorescence analysis of low Z elements on silicon wafer surfaces at the PTB monochromator beamline for undulator radiation at the electron storage ring BESSY II

Spectrochimica Acta Part B Atomic Spectroscopy ◽

10.1016/s0584-8547(01)00320-2 ◽

2001 ◽

Vol 56 (11) ◽

pp. 2073-2083 ◽

Author(s):

B Beckhoff ◽

R Fliegauf ◽

G Ulm ◽

G Pepponi ◽

C Streli ◽

...

Keyword(s):

Silicon Wafer ◽

Storage Ring ◽

Fluorescence Analysis ◽

Total Reflection ◽

Electron Storage ◽

Undulator Radiation ◽

X Ray ◽

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Analysis of depth profile for impurity concentration in Si wafer by synchrotron radiation excited total reflection X-ray fluorescence spectroscopy

Spectrochimica Acta Part B Atomic Spectroscopy ◽

10.1016/s0584-8547(03)00103-4 ◽

2003 ◽

Vol 58 (8) ◽

pp. 1445-1452 ◽

Author(s):

Byung-Kook Huh ◽

Jae-Song Kim ◽

Nam-Su Shin ◽

Yang-Mo Koo ◽

Hye-Young Chung

Keyword(s):

Synchrotron Radiation ◽

Fluorescence Spectroscopy ◽

Depth Profile ◽

Impurity Concentration ◽

Total Reflection ◽

X Ray ◽

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Ultra-trace analysis of metallic contaminations on silicon wafer surfaces by vapour phase decomposition/total reflection X-ray fluorescence (VPD/TXRF)

Spectrochimica Acta Part B Atomic Spectroscopy ◽

10.1016/0584-8547(91)80186-7 ◽

1991 ◽

Vol 46 (10) ◽

pp. 1369-1377 ◽

Author(s):

C. Neumann ◽

P. Eichinger

Keyword(s):

Silicon Wafer ◽

Trace Analysis ◽

Vapour Phase ◽

Total Reflection ◽

Phase Decomposition ◽

X Ray ◽

Ultra Trace ◽

Wafer Surfaces ◽

Ultra Trace Analysis

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Analysis of Ni on Si-wafer surfaces using synchrotron radiation excited total reflection X-ray fluorescence analysis

Spectrochimica Acta Part B Atomic Spectroscopy ◽

10.1016/s0584-8547(96)01674-6 ◽

1997 ◽

Vol 52 (7) ◽

pp. 901-906 ◽

Author(s):

P. Wobrauschek ◽

R. Görgl ◽

P. Kregsamer ◽

Ch. Streli ◽

S. Pahlke ◽

...

Keyword(s):

Synchrotron Radiation ◽

Fluorescence Analysis ◽

Total Reflection ◽

X Ray ◽

Wafer Surfaces ◽

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Analysis of low Z elements on Si wafer surfaces with synchrotron radiation induced total reflection X-ray fluorescence at SSRL, Beamline 3-3: comparison of droplets with spin coated wafers

Spectrochimica Acta Part B Atomic Spectroscopy ◽

10.1016/s0584-8547(03)00218-0 ◽

2003 ◽

Vol 58 (12) ◽

pp. 2105-2112 ◽

Author(s):

C. Streli ◽

G. Pepponi ◽

P. Wobrauschek ◽

N. Zöger ◽

P. Pianetta ◽

...

Keyword(s):

Synchrotron Radiation ◽

Total Reflection ◽

X Ray ◽

Radiation Induced ◽

Wafer Surfaces ◽

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Application of Total Reflection X-Ray Fluorescence Analysis for Metallic Trace Impurities on Silicon Wafer Surfaces

Semiconductor Fabrication: Technology and Metrology ◽

10.1520/stp26047s ◽

2008 ◽

pp. 305-305-9 ◽

Author(s):

P Eichinger ◽

HJ Rath ◽

H Schwenke

Keyword(s):

Silicon Wafer ◽

Fluorescence Analysis ◽

Total Reflection ◽

Trace Impurities ◽

X Ray ◽

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