HVEM observation of crack tip dislocations in silicon crystals

2001 ◽  
Vol 319-321 ◽  
pp. 683-686 ◽  
Author(s):  
K Higashida ◽  
T Kawamura ◽  
T Morikawa ◽  
Y Miura ◽  
N Narita ◽  
...  
Keyword(s):  
2004 ◽  
Vol 387-389 ◽  
pp. 377-380 ◽  
Author(s):  
Kenji Higashida ◽  
Masaki Tanaka ◽  
Ena Matsunaga ◽  
Hironori Hayashi

2005 ◽  
Vol 475-479 ◽  
pp. 4043-4046 ◽  
Author(s):  
Kenji Higashida ◽  
Masaki Tanaka ◽  
Ryuta Onodera

The present paper describes the nature of crack tip plasticity in silicon crystals examined by high voltage electron microscopy (HVEM) and atomic force microscopy (AFM). Firstly, AFM images around a crack tip are presented, where the formation of fine slip bands with the step heights of one or two nanometers is demonstrated. Secondly, crack-tip dislocations observed by HVEM are exhibited, where it is emphasized that dislocation characterization is essential to consider the relief mechanism of crack-tip stress concentration.


2005 ◽  
pp. 4043-4046 ◽  
Author(s):  
Kenji Higashida ◽  
Masaki Tanaka ◽  
Ryuta Onodera
Keyword(s):  

Author(s):  
D. Goyal ◽  
A. H. King

TEM images of cracks have been found to give rise to a moiré fringe type of contrast. It is apparent that the moire fringe contrast is observed because of the presence of a fault in a perfect crystal, and is characteristic of the fault geometry and the diffracting conditions in the TEM. Various studies have reported that the moire fringe contrast observed due to the presence of a crack in an otherwise perfect crystal is distinctive of the mode of crack. This paper describes a technique to study the geometry and mode of the cracks by comparing the images they produce in the TEM because of the effect that their displacement fields have on the diffraction of electrons by the crystal (containing a crack) with the corresponding theoretical images. In order to formulate a means of matching experimental images with theoretical ones, displacement fields of dislocations present (if any) in the vicinity of the crack are not considered, only the effect of the displacement field of the crack is considered.The theoretical images are obtained using a computer program based on the two beam approximation of the dynamical theory of diffraction contrast for an imperfect crystal. The procedures for the determination of the various parameters involved in these computations have been well documented. There are three basic modes of crack. Preliminary studies were carried out considering the simplest form of crack geometries, i. e., mode I, II, III and the mixed modes, with orthogonal crack geometries. It was found that the contrast obtained from each mode is very distinct. The effect of variation of operating conditions such as diffracting vector (), the deviation parameter (ω), the electron beam direction () and the displacement vector were studied. It has been found that any small change in the above parameters can result in a drastic change in the contrast. The most important parameter for the matching of the theoretical and the experimental images was found to be the determination of the geometry of the crack under consideration. In order to be able to simulate the crack image shown in Figure 1, the crack geometry was modified from a orthogonal geometry to one with a crack tip inclined to the original crack front. The variation in the crack tip direction resulted in the variation of the displacement vector also. Figure 1 is a cross-sectional micrograph of a silicon wafer with a chromium film on top, showing a crack in the silicon.


1998 ◽  
Vol 536 ◽  
Author(s):  
V. P. Popov ◽  
A. K. Gutakovsky ◽  
I. V. Antonova ◽  
K. S. Zhuravlev ◽  
E. V. Spesivtsev ◽  
...  

AbstractA study of Si:H layers formed by high dose hydrogen implantation (up to 3x107cm-2) using pulsed beams with mean currents up 40 mA/cm2 was carried out in the present work. The Rutherford backscattering spectrometry (RBS), channeling of He ions, and transmission electron microscopy (TEM) were used to study the implanted silicon, and to identify the structural defects (a-Si islands and nanocrystallites). Implantation regimes used in this work lead to creation of the layers, which contain hydrogen concentrations higher than 15 at.% as well as the high defect concentrations. As a result, the nano- and microcavities that are created in the silicon fill with hydrogen. Annealing of this silicon removes the radiation defects and leads to a nanocrystalline structure of implanted layer. A strong energy dependence of dechanneling, connected with formation of quasi nanocrystallites, which have mutual small angle disorientation (<1.50), was found after moderate annealing in the range 200-500°C. The nanocrystalline regions are in the range of 2-4 nm were estimated on the basis of the suggested dechanneling model and transmission electron microscopy (TEM) measurements. Correlation between spectroscopic ellipsometry, visible photoluminescence, and sizes of nanocrystallites in hydrogenated nc-Si:H is observed.


Sign in / Sign up

Export Citation Format

Share Document