Ultraviolet photoelectron spectroscopy, Auger electron spectroscopy, low-energy electron diffraction and flash-desorption studies of the chemisorption and decomposition of H2S and H2O on W(100)

Author(s):  
Ashok K. Bhattacharya ◽  
Lionel J. Clarke ◽  
Leonardo Morales de la Garza
1994 ◽  
Vol 01 (02n03) ◽  
pp. 285-293 ◽  
Author(s):  
A.V. ZOTOV ◽  
S.V. RYZHKOV ◽  
V.G. LIFSHITS ◽  
V.G. DUCHINSKY

The formation of the ordered surface structures upon successive deposition of Al and Sb onto the Si(100), Si(111), and Si(110) surfaces held at about 650°C were studied by low-energy electron diffraction (LEED) and Auger electron spectroscopy (AES). The primary emphasis was given to the investigation of the formation of (Al, Sb)/Si interface at total coverages of adsorbates in submonolayer range. In this case, according to AES data the adsorption of Al and Sb atoms proceeds collaterally in a simple additive manner. In the LEED observations, several new reconstructions, Si (100)c(4×4), Si (100)2×8, Si(100)2×6, Si(111)2×2, [Formula: see text], and Si (110)3×4 which indicate the formation of the joint (Al, Sb)/Si surface phases were found. The conditions for the formation of the surface structures were summarized in the formation diagrams.


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