Theoretical and Experimental Aspects of Induced Rigidity in Polymeric Systems at Isotropic-Anisotropic Phase Equilibrium

1984 ◽  
Vol 105 (1) ◽  
pp. 315-327 ◽  
Author(s):  
Robert Matheson
Keyword(s):  
Phase Equilibrium ◽  
Polymeric Systems ◽  
Anisotropic Phase

Novel organic, polymeric materials for electronics applications

2002 ◽  
Vol 722 ◽  
Author(s):  
Ram W. Sabnis ◽  
Mary J. Spencer ◽  
Douglas J. Guerrero
Keyword(s):  
Optical Density ◽  
Chemical Vapor ◽  
Polymeric Materials ◽  
Substantial Improvement ◽  
Polymeric Systems ◽  
Patterned Wafers ◽  
Visible Spectra ◽  
Potential Applications ◽  
Deep Ultraviolet ◽  
Deposited Films

AbstractNovel organic, polymeric materials and processes of depositing thin films on electronics substrates by chemical vapor deposition (CVD) have been developed and the lithographic behavior of photoresist coated over these CVD films at deep ultraviolet (DUV) wavelength has been evaluated. The specific monomers synthesized for DUV applications include [2.2](1,4)- naphthalenophane, [2.2](9,10)-anthracenophane and their derivatives which showed remarkable film uniformity on flat wafers and conformality over structured topography wafers, upon polymerization by CVD. The chemical, physical and optical properties of the deposited films have been characterized by measuring parameters such as thickness uniformity, solubility, conformality, adhesion to semiconductor substrates, ultraviolet-visible spectra, optical density, optical constants, defectivity, and resist compatibility. Scanning electron microscope (SEM) photos of cross-sectioned patterned wafers showed verticle profiles with no footing, standing waves or undercut. Resist profiles down to 0.10 νm dense lines and 0.09 νm isolated lines were achieved in initial tests. CVD coatings generated 96-100% conformal films, which is a substantial improvement over commercial spin-on polymeric systems. The light absorbing layers have high optical density at 248 nm and are therefore capable materials for DUV lithography applications. CVD is a potentially useful technology to extend lithography for sub-0.15 νm devices. These films have potential applications in microelectronics, optoelectronics and photonics.

Study on the Phase Equilibrium of Gas Hydrate Based on Main-Branch Pipe Confluence Model

2019 ◽  
Author(s):  
Song Deng ◽  
Yali Liu ◽  
Xia Wei ◽  
Lei Tao ◽  
Yanfeng He
Keyword(s):  
Phase Equilibrium ◽  
Gas Hydrate ◽  
Branch Pipe ◽  
Confluence Model

EXPERIMENTAL PHASE EQUILIBRIUM OF SULFUR HEXAFLUORIDE AND MINERAL OIL

2020 ◽  
Author(s):  
Afonso Ferreira Miguel Junior ◽  
Luiz Fernando Santos de Vasconcelos ◽  
Celina Kakitani ◽  
césar yutaka ofuchi ◽  
Moisés Marcelino Neto ◽  
...  
Keyword(s):  
Phase Equilibrium ◽  
Sulfur Hexafluoride ◽  
Mineral Oil ◽  
Experimental Phase ◽  
Experimental Phase Equilibrium
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