Synthesis of Thick Diamond Films by Direct Current Hot-Cathode Plasma Chemical Vapour Deposition

Chinese Physics Letters ◽

10.1088/0256-307x/19/9/349 ◽

2002 ◽

Vol 19 (9) ◽

pp. 1374-1376 ◽

Author(s):

Jin Zeng-Sun ◽

Jiang Zhi-Gang ◽

Bai Yi-Zhen ◽

Lu Xian-Yi

Keyword(s):

Chemical Vapour Deposition ◽

Direct Current ◽

Vapour Deposition ◽

Diamond Films ◽

Chemical Vapour ◽

Plasma Chemical ◽

Cathode Plasma ◽

Plasma Chemical Vapour Deposition

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Growth and properties of diamond films prepared by microwave plasma chemical vapour deposition using different oxygen-containing source gases

Surface and Coatings Technology ◽

10.1016/0257-8972(91)90263-v ◽

1991 ◽

Vol 47 (1-3) ◽

pp. 13-21 ◽

Author(s):

L. Schäfer ◽

C.-P. Klages

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapour ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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Cathodoluminescence of diamond films grown on pretreated Si (001) substrates by microwave plasma chemical vapour deposition

Diamond and Related Materials ◽

10.1016/s0925-9635(98)00279-9 ◽

1999 ◽

Vol 8 (2-5) ◽

pp. 712-716 ◽

Author(s):

Do-Geun Kim ◽

Tae-Yeon Seong ◽

Young-Joon Baik ◽

M.A Stevens Kalceff ◽

M.R Phillips

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapour ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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STUDIES OF INTERNAL STRESS IN DIAMOND FILMS PREPA-RED BY DC PLASMA CHEMICAL VAPOUR DEPOSITION

Acta Physica Sinica ◽

10.7498/aps.41.1906 ◽

1992 ◽

Vol 41 (11) ◽

pp. 1906

Author(s):

WANG WAN-LU ◽

GAO JIN-TING ◽

LIAO KE-JUN ◽

LIU AN-MIN

Keyword(s):

Internal Stress ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Diamond Films ◽

Chemical Vapour ◽

Plasma Chemical ◽

Dc Plasma ◽

Plasma Chemical Vapour Deposition

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Study on I–V characteristics of diamond films synthesized by D.C. arc discharge plasma chemical vapour deposition

Thin Solid Films ◽

10.1016/0040-6090(91)90467-c ◽

1991 ◽

Vol 205 (1) ◽

pp. 39-42 ◽

Author(s):

Fangqing Zhang ◽

Wenjun Zhang ◽

Maorui Chen ◽

Guanghua Chen ◽

Xiangliu Jiang

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Discharge Plasma ◽

Arc Discharge ◽

Diamond Films ◽

Chemical Vapour ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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Internal stress analysis in diamond films formed by d.c. plasma chemical vapour deposition

Thin Solid Films ◽

10.1016/0040-6090(92)90433-c ◽

1992 ◽

Vol 215 (2) ◽

pp. 174-178 ◽

Author(s):

Wang Wanlu ◽

Liao Kejun ◽

Gao Jinying ◽

Liu Aimin

Keyword(s):

Stress Analysis ◽

Internal Stress ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Diamond Films ◽

Chemical Vapour ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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Electron beam activated plasma chemical vapour deposition of polycrystalline diamond films

phys stat sol (a) ◽

10.1002/pssa.2211510112 ◽

1995 ◽

Vol 151 (1) ◽

pp. 107-112 ◽

Author(s):

A. Nayak ◽

H. D. Banerjee

Keyword(s):

Electron Beam ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Diamond Films ◽

Chemical Vapour ◽

Polycrystalline Diamond ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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Microwave plasma chemical vapour deposition of high purity diamond films

Diamond and Related Materials ◽

10.1016/0925-9635(93)90091-f ◽

1993 ◽

Vol 2 (2-4) ◽

pp. 402-406 ◽

Author(s):

M.G. Jubber ◽

J.I.B. Wilson ◽

I.C. Drummond ◽

P. John ◽

D.K. Milne

Keyword(s):

Chemical Vapour Deposition ◽

High Purity ◽

Vapour Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapour ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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Electrical properties of boron-doped diamond films prepared by microwave plasma chemical vapour deposition

Thin Solid Films ◽

10.1016/0040-6090(96)08649-x ◽

1996 ◽

Vol 281-282 ◽

pp. 267-270 ◽

Author(s):

Masahiro Deguchi ◽

Makoto Kitabatake ◽

Takashi Hirao

Keyword(s):

Electrical Properties ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapour ◽

Plasma Chemical ◽

Boron Doped Diamond ◽

Boron Doped ◽

Plasma Chemical Vapour Deposition

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Microwave plasma chemical vapour deposition of tetramethylsilane: correlations between optical emission spectroscopy and film characteristics

Surface and Coatings Technology ◽

10.1016/s0257-8972(01)01081-7 ◽

2001 ◽

Vol 142-144 ◽

pp. 314-320 ◽

Author(s):

L. Thomas ◽

L. Maillé ◽

J.M. Badie ◽

M. Ducarroir

Keyword(s):

Chemical Vapour Deposition ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Optical Emission ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Film Characteristics

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Preparation of (Tl, Bi, Pb)-Sr-Ca-Cu-O superconducting thin films by the mist microwave plasma chemical vapour deposition method

Journal of Materials Science Letters ◽

10.1007/bf00422674 ◽

1995 ◽

Vol 14 (23) ◽

pp. 1681-1683

Author(s):

N. Takahashi ◽

A. Koukitu ◽

H. Seki

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Superconducting Thin Films ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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