Microwave plasma chemical vapour deposition of tetramethylsilane: correlations between optical emission spectroscopy and film characteristics

2001 ◽  
Vol 142-144 ◽  
pp. 314-320 ◽  
Author(s):  
L. Thomas ◽  
L. Maillé ◽  
J.M. Badie ◽  
M. Ducarroir
Keyword(s):  
Chemical Vapour Deposition ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Vapour Deposition ◽  
Microwave Plasma ◽  
Chemical Vapour ◽  
Optical Emission ◽  
Plasma Chemical ◽  
Plasma Chemical Vapour Deposition ◽  
Film Characteristics

Diamond film growth by pulse-modulated magnetoactive microwave plasma chemical vapour deposition

1996 ◽  
Vol 281-282 ◽  
pp. 264-266 ◽  
Author(s):  
Akimitsu Hatta ◽  
Hidetoshi Suzuki ◽  
Ken-ichi Kadota ◽  
Toshimichi Ito ◽  
Akio Hiraki
Keyword(s):  
Chemical Vapour Deposition ◽  
Diamond Film ◽  
Vapour Deposition ◽  
Film Growth ◽  
Microwave Plasma ◽  
Chemical Vapour ◽  
Plasma Chemical ◽  
Plasma Chemical Vapour Deposition ◽  
Diamond Film Growth

Deposition of crystalline C3N4 films via microwave plasma chemical vapour deposition

2007 ◽  
Vol 61 (11-12) ◽  
pp. 2243-2246 ◽  
Author(s):  
Jinchun Jiang ◽  
Wenjuan Cheng ◽  
Yang Zhang ◽  
Minbo Lan ◽  
Hesun Zhu ◽  
...  
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Microwave Plasma ◽  
Chemical Vapour ◽  
Plasma Chemical ◽  
Plasma Chemical Vapour Deposition
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