Microwave plasma chemical vapour deposition of high purity diamond films

Diamond and Related Materials ◽

10.1016/0925-9635(93)90091-f ◽

1993 ◽

Vol 2 (2-4) ◽

pp. 402-406 ◽

Author(s):

M.G. Jubber ◽

J.I.B. Wilson ◽

I.C. Drummond ◽

P. John ◽

D.K. Milne

Keyword(s):

Chemical Vapour Deposition ◽

High Purity ◽

Vapour Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapour ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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Growth and properties of diamond films prepared by microwave plasma chemical vapour deposition using different oxygen-containing source gases

Surface and Coatings Technology ◽

10.1016/0257-8972(91)90263-v ◽

1991 ◽

Vol 47 (1-3) ◽

pp. 13-21 ◽

Author(s):

L. Schäfer ◽

C.-P. Klages

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapour ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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Cathodoluminescence of diamond films grown on pretreated Si (001) substrates by microwave plasma chemical vapour deposition

Diamond and Related Materials ◽

10.1016/s0925-9635(98)00279-9 ◽

1999 ◽

Vol 8 (2-5) ◽

pp. 712-716 ◽

Author(s):

Do-Geun Kim ◽

Tae-Yeon Seong ◽

Young-Joon Baik ◽

M.A Stevens Kalceff ◽

M.R Phillips

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapour ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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Electrical properties of boron-doped diamond films prepared by microwave plasma chemical vapour deposition

Thin Solid Films ◽

10.1016/0040-6090(96)08649-x ◽

1996 ◽

Vol 281-282 ◽

pp. 267-270 ◽

Author(s):

Masahiro Deguchi ◽

Makoto Kitabatake ◽

Takashi Hirao

Keyword(s):

Electrical Properties ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapour ◽

Plasma Chemical ◽

Boron Doped Diamond ◽

Boron Doped ◽

Plasma Chemical Vapour Deposition

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Microwave plasma chemical vapour deposition of tetramethylsilane: correlations between optical emission spectroscopy and film characteristics

Surface and Coatings Technology ◽

10.1016/s0257-8972(01)01081-7 ◽

2001 ◽

Vol 142-144 ◽

pp. 314-320 ◽

Author(s):

L. Thomas ◽

L. Maillé ◽

J.M. Badie ◽

M. Ducarroir

Keyword(s):

Chemical Vapour Deposition ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Optical Emission ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Film Characteristics

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Preparation of (Tl, Bi, Pb)-Sr-Ca-Cu-O superconducting thin films by the mist microwave plasma chemical vapour deposition method

Journal of Materials Science Letters ◽

10.1007/bf00422674 ◽

1995 ◽

Vol 14 (23) ◽

pp. 1681-1683

Author(s):

N. Takahashi ◽

A. Koukitu ◽

H. Seki

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Superconducting Thin Films ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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MICROWAVE PLASMA CHEMICAL VAPOUR DEPOSITION OF DIAMOND: ITS GROWTH AND CHARACTERIZATION

Metallurgical Coatings and Thin Films 1990 ◽

10.1016/b978-1-85166-813-7.50013-9 ◽

1990 ◽

pp. 53-62

Author(s):

CHIA-FU CHEN ◽

KAZUHITO NISHIMURA ◽

ENSEI KO ◽

EIJI OGAWA ◽

SATORU HOSOMI ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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The temperature dependence of the resistance of diamond film synthesized by microwave plasma chemical vapour deposition method

Vacuum ◽

10.1016/0042-207x(91)91423-l ◽

1991 ◽

Vol 42 (16) ◽

pp. 1083

Author(s):

Yang Bangchao ◽

Gou Li ◽

Jia Yuming

Keyword(s):

Temperature Dependence ◽

Chemical Vapour Deposition ◽

Diamond Film ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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Field emission characteristics of nano-sheet carbon films deposited by quartz-tube microwave plasma chemical vapour deposition

Chinese Physics B ◽

10.1088/1674-1056/17/4/053 ◽

2008 ◽

Vol 17 (4) ◽

pp. 1467-1471 ◽

Author(s):

Gu Guang-Rui ◽

Jin Zhe ◽

Ito Toshimichi

Keyword(s):

Field Emission ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Carbon Films ◽

Quartz Tube ◽

Emission Characteristics ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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Synthesis of Thick Diamond Films by Direct Current Hot-Cathode Plasma Chemical Vapour Deposition

Chinese Physics Letters ◽

10.1088/0256-307x/19/9/349 ◽

2002 ◽

Vol 19 (9) ◽

pp. 1374-1376 ◽

Author(s):

Jin Zeng-Sun ◽

Jiang Zhi-Gang ◽

Bai Yi-Zhen ◽

Lu Xian-Yi

Keyword(s):

Chemical Vapour Deposition ◽

Direct Current ◽

Vapour Deposition ◽

Diamond Films ◽

Chemical Vapour ◽

Plasma Chemical ◽

Cathode Plasma ◽

Plasma Chemical Vapour Deposition

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Thermoelectric power of polycrystalline Si films prepared by microwave plasma chemical vapour deposition

Thin Solid Films ◽

10.1016/0040-6090(96)08600-2 ◽

1996 ◽

Vol 281-282 ◽

pp. 159-161 ◽

Author(s):

So Yonekubo ◽

Kiichi Kamimura ◽

Yoshiharu Onuma

Keyword(s):

Thermoelectric Power ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

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