Self-Guiding of Ultrashort, Relativistically Intense Laser Pulses through Underdense Plasmas in the Blowout Regime

2009 ◽  
Vol 102 (17) ◽  
Author(s):  
J. E. Ralph ◽  
K. A. Marsh ◽  
A. E. Pak ◽  
W. Lu ◽  
C. E. Clayton ◽  
...  
Keyword(s):  
Laser Pulses ◽  
Intense Laser ◽  
Intense Laser Pulses ◽  
Underdense Plasmas

Scattering of relativistically intense laser pulses in cold underdense plasmas

1999 ◽  
Author(s):  
A. V. Borovsky ◽  
A. L. Galkin ◽  
Vladlen V. Korobkin ◽  
O. B. Shiryaev
Keyword(s):  
Laser Pulses ◽  
Intense Laser ◽  
Intense Laser Pulses ◽  
Underdense Plasmas

scholarly journals Interaction features of two ultra-intense laser pulses self-trapped in underdense plasmas

AIP Advances ◽  
2020 ◽  
Vol 10 (2) ◽  
pp. 025313
Author(s):  
R. X. Bai ◽  
C. T. Zhou ◽  
T. W. Huang ◽  
L. B. Ju ◽  
S. Z. Wu ◽  
...  
Keyword(s):  
Laser Pulses ◽  
Intense Laser ◽  
Intense Laser Pulses ◽  
Underdense Plasmas

scholarly journals High laser induced damage threshold photoresists for nano-imprint and 3D multi-photon lithography

Nanophotonics ◽  
2021 ◽  
Vol 0 (0) ◽  
Author(s):  
Elmina Kabouraki ◽  
Vasileia Melissinaki ◽  
Amit Yadav ◽  
Andrius Melninkaitis ◽  
Konstantina Tourlouki ◽  
...  
Keyword(s):  
Nanoimprint Lithography ◽  
Three Dimensional ◽  
Damage Threshold ◽  
Laser Pulses ◽  
Intense Laser ◽  
Optical Elements ◽  
Photonic Circuits ◽  
Future Production ◽  
Intense Laser Pulses ◽  
Laser Induced Damage

Abstract Optics manufacturing technology is predicted to play a major role in the future production of integrated photonic circuits. One of the major drawbacks in the realization of photonic circuits is the damage of optical materials by intense laser pulses. Here, we report on the preparation of a series of organic–inorganic hybrid photoresists that exhibit enhanced laser-induced damage threshold. These photoresists showed to be candidates for the fabrication of micro-optical elements (MOEs) using three-dimensional multiphoton lithography. Moreover, they demonstrate pattern ability by nanoimprint lithography, making them suitable for future mass production of MOEs.

scholarly journals Precise description of single and double ionization of hydrogen molecule in intense laser pulses

2012 ◽  
Vol 137 (4) ◽  
pp. 044112 ◽  
Author(s):  
Mohsen Vafaee ◽  
Firoozeh Sami ◽  
Babak Shokri ◽  
Behnaz Buzari ◽  
Hassan Sabzyan
Keyword(s):  
Hydrogen Molecule ◽  
Laser Pulses ◽  
Double Ionization ◽  
Intense Laser ◽  
Precise Description ◽  
Intense Laser Pulses
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