scholarly journals AUXIN RESPONSE FACTOR17 Is Essential for Pollen Wall Pattern Formation in Arabidopsis

2013 ◽  
Vol 162 (2) ◽  
pp. 720-731 ◽  
Author(s):  
Jun Yang ◽  
Lei Tian ◽  
Ming-Xi Sun ◽  
Xue-Yong Huang ◽  
Jun Zhu ◽  
...  
Keyword(s):  
Pattern Formation ◽  
Pollen Wall ◽  
Auxin Response

scholarly journals ENDOMEMBRANES AND POLLEN WALL PATTERN FORMATION IN VIGNA VEXILLATA L.

HortScience ◽  
1992 ◽  
Vol 27 (6) ◽  
pp. 642a-642
Author(s):  
Carlos A. Perez-Munoz ◽  
Barbara D. Webster
Keyword(s):  
Pattern Formation ◽  
Causal Relationship ◽  
Electron Micrographs ◽  
Pollen Wall ◽  
Membrane Systems ◽  
Membrane Structures ◽  
Wall Formation ◽  
Vigna Vexillata ◽  
Further Development ◽  
Development Proceeds

During the initiation of pollen exine wall formation in Vigna, localized accumulations of membranes in the microspore cortex coincide with sites which during further development reflect the lumina of me reticulate exine, and with apertural sites. Multi-membrane bodies are prominent in the cytoplasm, especially subtending aperture sites. Multi-membrane structures continue to be present as pollen wall development proceeds, notably during the early patterning stages. Labelling with the endomembrane-specific fluorochrome DiOC6 does not conclusively lead to membrane identification. However, electron micrographs illustrate elaborate membrane systems during stages when the most obvious developmental activity is initiation of the microspore wall. This suggests that there may be a causal relationship between endomembranes and exine pattern formation.

scholarly journals The Roles of the Sole Activator-Type Auxin Response Factor in Pattern Formation of Marchantia polymorpha

2017 ◽  
Vol 58 (10) ◽  
pp. 1642-1651 ◽  
Author(s):  
Hirotaka Kato ◽  
Masaru Kouno ◽  
Mayuko Takeda ◽  
Hidemasa Suzuki ◽  
Kimitsune Ishizaki ◽  
...  
Keyword(s):  
Pattern Formation ◽  
Auxin Response Factor ◽  
Marchantia Polymorpha ◽  
Response Factor ◽  
Auxin Response

Pattern formation in the splay Freedericks transition of a nematic side-group polysiloxane

1993 ◽  
Vol 3 (6) ◽  
pp. 865-889 ◽  
Author(s):  
Norbert Schwenk ◽  
Hans Wolfgang Spiess
Keyword(s):  
Pattern Formation ◽  
Side Group

Pattern Formation in Thin Polymer Films: A New Morphology

2000 ◽  
Vol 629 ◽  
Author(s):  
Jean-Loup Masson ◽  
Peter F. Green
Keyword(s):  
Growth Rate ◽  
Pattern Formation ◽  
Early Stage ◽  
Structural Evolution ◽  
Distinct Form ◽  
Thin Polymer Films ◽  
Intermediate Morphology ◽  
Thin Polymer ◽  
Nonwetting Liquid ◽  
Cylindrical Holes

ABSTRACTResearchers have shown that thin, nonwetting, liquid homopolymer films dewet substrates, forming patterns that reflect fluctuations in the local film thickness. These patterns have been shown to be either discrete cylindrical holes or bicontinuous “spinodal-like” patterns. In this paper we show the existence of a new morphology. During the early stage of dewetting, discrete highly asymmetric holes appear spontaneously throughout the film. The nucleation rate of these holes is faster than their growth rate. The morphology of the late stage of evolution, after 18 days, is characterized by a bicontinuous pattern, distinct form conventional spinodal dewetting patterns. This morphology has been observed for a range of film thicknesses between 7.5 and 21nm. The structural evolution of this intermediate morphology is discussed.

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