Coulomb interaction effect correction in e-beam block exposure lithography

Author(s):  
K. Takahashi ◽  
Y. Nara ◽  
Y. Manabe ◽  
H. Hoshino ◽  
Y. Machida
1999 ◽  
Vol 38 (Part 1, No. 12B) ◽  
pp. 7217-7221 ◽  
Author(s):  
Kimitoshi Takahashi ◽  
Yasuo Manabe ◽  
Hiromi Hoshino ◽  
Yasuo Nara ◽  
Yasuhide Machida

1995 ◽  
Vol 34 (Part 1, No. 12B) ◽  
pp. 6684-6688 ◽  
Author(s):  
Hiroshi Yamashita ◽  
Takao Tamura ◽  
Eiichi Nomura ◽  
Hiroshi Nozue

2019 ◽  
Vol 126 (23) ◽  
pp. 234301 ◽  
Author(s):  
Yu-jie Zhang ◽  
Wen-Jie Wang ◽  
Ding-bang Zhou ◽  
Jian-Ping Xu ◽  
Gong-tang Wang ◽  
...  

1995 ◽  
Vol 34 (12S) ◽  
pp. 6684 ◽  
Author(s):  
Hiroshi Yamashita ◽  
Takao Tamura ◽  
Eiichi Nomura ◽  
Hiroshi Nozue Hiroshi Nozue

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