Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference
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Stress stability of W-Ti X-ray absorber in patterning process

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference ◽

10.1109/imnc.1999.797498 ◽

2003 ◽

Author(s):

K. Kitamura ◽

H. Yabe ◽

S. Ami ◽

K. Kise ◽

S. Aya ◽

...

Keyword(s):

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Coulomb interaction effect correction in e-beam block exposure lithography

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference ◽

10.1109/imnc.1999.797464 ◽

2003 ◽

Author(s):

K. Takahashi ◽

Y. Nara ◽

Y. Manabe ◽

H. Hoshino ◽

Y. Machida

Keyword(s):

Coulomb Interaction ◽

Interaction Effect

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Progress in ArF single-layer resists

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference ◽

10.1109/imnc.1999.797483 ◽

2003 ◽

Author(s):

S. Takechi ◽

A. Otoguro ◽

T. Arita

Keyword(s):

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Characteristics of 193 nm chemically amplified resist during post exposure bake and post exposure delay

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference ◽

10.1109/imnc.1999.797492 ◽

2003 ◽

Author(s):

Eun-Mi Lee ◽

Moon-Gyu Sung ◽

Young-Mi Lee ◽

Young-Soo Sohn ◽

Hye-Keun Oh

Keyword(s):

Post Exposure ◽

Chemically Amplified ◽

Chemically Amplified Resist ◽

Post Exposure Bake ◽

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System LSI; the engine of the semiconductor industry

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference ◽

10.1109/imnc.1999.797447 ◽

2003 ◽

Author(s):

F. Nakamura

Keyword(s):

Semiconductor Industry

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Coulomb blockade phenomena in low-dimensional Si MOSFETs fabricated using focused-ion beam implantation

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference ◽

10.1109/imnc.1999.797509 ◽

2003 ◽

Author(s):

H. Kondo ◽

S. Baba ◽

K. Izumikawa ◽

M. Sakurai ◽

S. Zaima ◽

...

Keyword(s):

Coulomb Blockade ◽

Focused Ion Beam ◽

Ion Beam ◽

Ion Beam Implantation ◽

Low Dimensional

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Study of loading effect during development and etching process in photomask fabrication

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference ◽

10.1109/imnc.1999.797549 ◽

2003 ◽

Author(s):

Ji-Hyeon Chai ◽

Byung-Gook Kim ◽

Chan-Uk Chun ◽

Sung-Yong Cho ◽

Sung-Woon Choi ◽

...

Keyword(s):

Etching Process ◽

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Low energy e-beam proximity lithography (LEEPL)

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference ◽

10.1109/imnc.1999.797462 ◽

2003 ◽

Author(s):

T. Utsumi

Keyword(s):

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Recent progress and future developments in EB mask writing for X-ray lithography

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference ◽

10.1109/imnc.1999.797450 ◽

2003 ◽

Author(s):

Y. Nakayama

Keyword(s):

Recent Progress ◽

X Ray ◽

Future Developments

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Microfabricated gas phase chemical analysis systems

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference ◽

10.1109/imnc.1999.797476 ◽

2003 ◽

Author(s):

G.C. Frye-Mason ◽

R.P. Manginell ◽

E.J. Heller ◽

C.M. Matzke ◽

S.A. Casalnuovo ◽

...

Keyword(s):

Chemical Analysis ◽

Gas Phase ◽

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