New mask format for low-energy electron-beam proximity projection lithography

2002 ◽  
Author(s):  
Kaoru Koike ◽  
Shinji Omori ◽  
Kazuya Iwase ◽  
Isao Ashida ◽  
Shigeru Moriya
Keyword(s):  
Electron Beam ◽  
Low Energy ◽  
Energy Electron ◽  
Projection Lithography ◽  
Low Energy Electron

Performance of beta tool for low-energy electron-beam proximity-projection lithography (LEEPL)

2003 ◽  
Author(s):  
Akira Yoshida ◽  
Haruo Kasahara ◽  
Akira Higuchi ◽  
Hiroshi Nozue ◽  
Akihiro Endo ◽  
...  
Keyword(s):  
Electron Beam ◽  
Low Energy ◽  
Energy Electron ◽  
Projection Lithography ◽  
Low Energy Electron

Completion of the β tool and the recent progress of low energy e-beam proximity projection lithography

2003 ◽  
Vol 21 (1) ◽  
pp. 311 ◽  
Author(s):  
Akihiro Endo ◽  
Akira Higuchi ◽  
Hiroshi Nozue ◽  
Nobuo Shimazu ◽  
Toyoji Fukui ◽  
...  
Keyword(s):  
Recent Progress ◽  
Low Energy ◽  
Projection Lithography

Recent progress of low-energy e-beam proximity projection lithography (LEEPL) with β-tool development

2002 ◽  
Author(s):  
Nobuo Shimazu ◽  
Hiroshi Nozue ◽  
Akihiro Endo ◽  
Akira Higuchi ◽  
T. Ise ◽  
...  
Keyword(s):  
Recent Progress ◽  
Low Energy ◽  
Tool Development ◽  
Projection Lithography

scholarly journals Ultra Thin Film Resist for Low Energy E-beam Projection Lithography.

2002 ◽  
Vol 15 (3) ◽  
pp. 417-422 ◽  
Author(s):  
Tsuyoshi Nakamura ◽  
Kiyoshi Ishikawa ◽  
Mitsuru Sato ◽  
Hiroshi Komano
Keyword(s):  
Thin Film ◽  
Low Energy ◽  
Projection Lithography ◽  
Beam Projection ◽  
Ultra Thin Film
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