Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468)
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Dynamics of mass-limited laser plasma targets as sources for EUVL

Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468) ◽

10.1109/imnc.2001.984104 ◽

2002 ◽

Author(s):

M. Richardson ◽

C. Keyser ◽

M. Al-Rabban ◽

R. Bernath

Keyword(s):

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Fluoropolymer platforms for 157 nm resist applications

Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468) ◽

10.1109/imnc.2001.984193 ◽

2002 ◽

Author(s):

H. Ito ◽

G.M. Wallraff ◽

N. Fender ◽

P.J. Brock ◽

H.D. Truong ◽

...

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A study of line edge roughness in chemically amplified resist for low energy electron-beam lithography

Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468) ◽

10.1109/imnc.2001.984209 ◽

2002 ◽

Author(s):

T. Nakasugi ◽

A. Ando ◽

R. Inanami ◽

N. Sasaki ◽

K. Sugihara

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Energy Electron ◽

Line Edge Roughness ◽

Chemically Amplified ◽

Edge Roughness ◽

Chemically Amplified Resist ◽

Low Energy Electron

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Si single-electron CCD

Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468) ◽

10.1109/imnc.2001.984197 ◽

2002 ◽

Author(s):

A. Fujiwara ◽

K. Yamazaki ◽

Y. Takahashi

Keyword(s):

Single Electron

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Inspection for critical issue of floating body effects in SOI-MOSFET using nuclear particles

Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468) ◽

10.1109/imnc.2001.984077 ◽

2002 ◽

Author(s):

S. Abo ◽

M. Mizutani ◽

K. Nakayama ◽

T. Takaoka ◽

T. Iwamatsu ◽

...

Keyword(s):

Critical Issue ◽

Floating Body ◽

Floating Body Effects

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Phase shifting interferometer for the characterization of nanodevices

Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468) ◽

10.1109/imnc.2001.984182 ◽

2002 ◽

Author(s):

P. Boher ◽

J.P. Piel ◽

J.L. Stehle ◽

A. Dubois ◽

A.C. Boccara

Keyword(s):

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A new PSM system: SCAAM with Phase Phirst!

Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468) ◽

10.1109/imnc.2001.984032 ◽

2002 ◽

Author(s):

M.D. Levenson ◽

T. Ebihara ◽

S. Desai ◽

S. White

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Development of low energy e-beam proximity projection lithography: LEEPL

Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468) ◽

10.1109/imnc.2001.984057 ◽

2002 ◽

Author(s):

N. Shimazu

Keyword(s):

Projection Lithography

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Subwavelength antireflection gratings for light emitting diodes and photodiodes fabricated by fast atom beam etching

Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468) ◽

10.1109/imnc.2001.984158 ◽

2002 ◽

Author(s):

M. Ishimori ◽

Y. Kanamori ◽

M. Sasaki ◽

K. Hane

Keyword(s):

Light Emitting Diodes ◽

Atom Beam ◽

Light Emitting ◽

Fast Atom Beam ◽

Fast Atom Beam Etching

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Monte Carlo simulation of substrate photoelectrons in hard X-ray lithography and the effect of buffer layer

Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468) ◽

10.1109/imnc.2001.984130 ◽

2002 ◽

Author(s):

Insoo Park ◽

Ohyun Kim

Keyword(s):

Monte Carlo Simulation ◽

Monte Carlo ◽

Buffer Layer ◽

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