Journal of Micro/Nanolithography MEMS and MOEMS
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TOTAL DOCUMENTS

1669
(FIVE YEARS 93)

H-INDEX

27
(FIVE YEARS 4)

Published By Spie - International Society For Optical Engineering

1932-5150
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

scholarly journals JM3 is Gone, Long Live JM3!

2020 ◽  
Vol 19 (04) ◽  
Author(s):  
Harry Levinson ◽  
Hans Zappe

scholarly journals Particle and pattern discriminant freeze-cleaning method

2020 ◽  
Vol 19 (04) ◽  
Author(s):  
Kei Hattori ◽  
Daisuke Matsushima ◽  
Kensuke Demura ◽  
Masaya Kamiya
Keyword(s):  
Cleaning Method

scholarly journals Perspectives and tradeoffs of absorber materials for high NA EUV lithography

2020 ◽  
Vol 19 (04) ◽  
Author(s):  
Andreas Erdmann ◽  
Hazem Mesilhy ◽  
Peter Evanschitzky ◽  
Vicky Philipsen ◽  
Frank Timmermans ◽  
...  
Keyword(s):  
Euv Lithography

scholarly journals High-power EUV lithography: spectral purity and imaging performance

2020 ◽  
Vol 19 (03) ◽  
Author(s):  
Mark van de Kerkhof ◽  
Fei Liu ◽  
Marieke Meeuwissen ◽  
Xueqing Zhang ◽  
Muharrem Bayraktar ◽  
...  
Keyword(s):  
High Power ◽  
Spectral Purity ◽  
Euv Lithography ◽  
Imaging Performance

Gradient-based source mask and polarization optimization with the hybrid Hopkins–Abbe model

2020 ◽  
Vol 19 (03) ◽  
Author(s):  
Ming Ding ◽  
Zhiyuan Niu ◽  
Fang Zhang ◽  
Linglin Zhu ◽  
Weijie Shi ◽  
...  
Keyword(s):  
Gradient Based

Construction of complex logic circuit based on nanoparticles

2020 ◽  
Vol 19 (03) ◽  
Author(s):  
Zhao Chen ◽  
Zhixiang Yin ◽  
Zhen Tang ◽  
Qiang Zhang
Keyword(s):  
Logic Circuit
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