V-3 doping profile measurement from avalanche space-charge resistance: A new technique

1974 ◽  
Vol 21 (11) ◽  
pp. 743-743
Author(s):  
G.H. Glover ◽  
W. Tantraporn
Keyword(s):  
Space Charge ◽  
Doping Profile ◽  
New Technique ◽  
Profile Measurement ◽  
A New Technique

SIMS∕ARXPS—A New Technique of Retained Dopant Dose and Profile Measurement of Low Energy Doping Processes

2008 ◽  
Author(s):  
Shu Qin ◽  
Kent Zhuang ◽  
Shifeng Lu ◽  
Allen McTeer ◽  
Wendy Morinville ◽  
...  
Keyword(s):  
Low Energy ◽  
New Technique ◽  
Profile Measurement ◽  
A New Technique

SPACE‐CHARGE INJECTION: A NEW TECHNIQUE FOR STUDYING NONUNIFORM FIELD BREAKDOWN PHENOMENA

1969 ◽  
Vol 15 (6) ◽  
pp. 155-156 ◽  
Author(s):  
R. C. Klewe ◽  
M. B. C. Quigley ◽  
B. A. Tozer
Keyword(s):  
Space Charge ◽  
Charge Injection ◽  
New Technique ◽  
Nonuniform Field ◽  
A New Technique

SIMS/ARXPS—A New Technique of Retained Dopant Dose and Profile Measurement of Ultralow-Energy Doping Processes

2009 ◽  
Vol 37 (1) ◽  
pp. 139-145 ◽  
Author(s):  
Shu Qin ◽  
Kent Zhuang ◽  
Shifeng Lu ◽  
A. McTeer ◽  
W. Morinville ◽  
...  
Keyword(s):  
New Technique ◽  
Profile Measurement ◽  
Ultralow Energy ◽  
A New Technique
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