Surface loss rates of H and Cl radicals in an inductively coupled plasma etcher derived from time-resolved electron density and optical emission measurements

2010 ◽  
Vol 28 (2) ◽  
pp. 360-372 ◽  
Author(s):  
G. A. Curley ◽  
L. Gatilova ◽  
S. Guilet ◽  
S. Bouchoule ◽  
G. S. Gogna ◽  
...  
1998 ◽  
Vol 57 (1) ◽  
pp. R43-R46 ◽  
Author(s):  
Masahiro Tadokoro ◽  
Hajime Hirata ◽  
Nobuhiko Nakano ◽  
Zoran Lj. Petrović ◽  
Toshiaki Makabe

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