Surface loss rates of H and Cl radicals in an inductively coupled plasma etcher derived from time-resolved electron density and optical emission measurements
2010 ◽
Vol 28
(2)
◽
pp. 360-372
◽
Keyword(s):
2019 ◽
Vol 47
(5)
◽
pp. 2102-2109
◽
2015 ◽
2009 ◽
2015 ◽
2015 ◽
2011 ◽