Characterization and correction of optical proximity effects in deep-ultraviolet lithography using behavior modeling

Author(s):  
Anthony Yen
1998 ◽  
Vol 37 (Part 1, No. 2) ◽  
pp. 571-576 ◽  
Author(s):  
Zhong-Tao Jiang ◽  
Tomuo Yamaguchi ◽  
Kentaro Ohshimo ◽  
Mitsuru Aoyama ◽  
Leo Asinovsky

Author(s):  
M. Fritze ◽  
S. Palmateer ◽  
P. Maki ◽  
J. Knecht ◽  
C. K. Chen ◽  
...  

2005 ◽  
Vol 44 (32) ◽  
pp. 6857 ◽  
Author(s):  
Xiyuan Liu ◽  
Karl-Heinz Brenner ◽  
Marco Wilzbach ◽  
Michael Schwarz ◽  
Thomas Fernholz ◽  
...  

2000 ◽  
Vol 39 (Part 1, No. 2A) ◽  
pp. 669-674
Author(s):  
Kazuyuki Sugita ◽  
Masakuni Ikagawa ◽  
Kieko Harada ◽  
Masahito Kushida ◽  
Kyoichi Saito

2011 ◽  
Vol 6 (3) ◽  
pp. 109 ◽  
Author(s):  
R. Sidharthan ◽  
V.M. Murukeshan

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