Next generation nanopatterning using small molecule inhibitors for area-selective atomic layer deposition
2021 ◽
Vol 39
(2)
◽
pp. 021002
Josiah Yarbrough
◽
Alex B. Shearer
◽
Stacey F. Bent
2015 ◽
Vol 9
(6)
◽
pp. 5884-5892
◽
Alexander C. Kozen
◽
Chuan-Fu Lin
◽
Alexander J. Pearse
◽
Marshall A. Schroeder
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Xiaogang Han
◽
...
2021 ◽
Vol MA2021-02
(29)
◽
pp. 858-858
Abdulla Bin Afif
◽
Anup L. Dadlani
◽
Stephanie Burgmann
◽
Peter Köllensperger
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Jan Torgersen
2019 ◽
Vol 6
(16)
◽
pp. 1900678
◽
Dayakar Gandla
◽
Daniel Qi Tan
Yanqiang Cao
◽
Xiangbo Meng
◽
Aidong Li
2015 ◽
Vol 2
(18)
◽
pp. 1500229
◽
Nancy A. Vogel
◽
Philip S. Williams
◽
Alexandra H. Brozena
◽
Dilara Sen
◽
Sarah Atanasov
◽
...
2020 ◽
Vol MA2020-02
(23)
◽
pp. 1695-1695
Mahmoud Ameen
◽
Ide Beeker
◽
Lucas Haverkate
◽
Bihag Anothumakkool
◽
Frank Grob
◽
...
2020 ◽
Vol 30
◽
pp. 296-328
◽
2019 ◽
Vol 40
(9)
◽
pp. 1311-1323
◽
Hongbo Zhang
◽
Christopher L. Marshall