atomic layer deposition
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2022 ◽  
Vol 284 ◽  
pp. 116995
Amélie Schultheiss ◽  
Abderrahime Sekkatz ◽  
Viet Huong Nguyen ◽  
Alexandre Carella ◽  
Anass Benayad ◽  

Coatings ◽  
2022 ◽  
Vol 12 (1) ◽  
pp. 84
Jiawei Li ◽  
Junren Xiang ◽  
Ge Yi ◽  
Yuanting Tang ◽  
Huachen Shao ◽  

Surface residual lithium compounds of Ni-rich cathodes are tremendous obstacles to electrochemical performance due to blocking ion/electron transfer and arousing surface instability. Herein, ultrathin and uniform Al2O3 coating via atomic layer deposition (ALD) coupled with the post-annealing process is reported to reduce residual lithium compounds on single-crystal LiNi0.6Mn0.2Co0.2O2 (NCM622). Surface composition characterizations indicate that LiOH is obviously reduced after Al2O3 growth on NCM622. Subsequent post-annealing treatment causes the consumption of Li2CO3 along with the diffusion of Al atoms into the surface layer of NCM622. The NCM622 modified by Al2O3 coating and post-annealing exhibits excellent cycling stability, the capacity retention of which reaches 92.2% after 300 cycles at 1 C, much higher than that of pristine NCM622 (34.8%). Reduced residual lithium compounds on NCM622 can greatly decrease the formation of LiF and the degree of Li+/Ni2+ cation mixing after discharge–charge cycling, which is the key to the improvement of cycling stability.

Langmuir ◽  
2022 ◽  
Wanxing Xu ◽  
Mitchel G. N. Haeve ◽  
Paul C. Lemaire ◽  
Kashish Sharma ◽  
Dennis M. Hausmann ◽  

Nanomaterials ◽  
2022 ◽  
Vol 12 (1) ◽  
pp. 172
Kai Zhao ◽  
Jingye Xie ◽  
Yudi Zhao ◽  
Dedong Han ◽  
Yi Wang ◽  

Transparent electrodes are a core component for transparent electron devices, photoelectric devices, and advanced displays. In this work, we fabricate fully-transparent, highly-conductive Al-doped ZnO (AZO) films using an atomic layer deposition (ALD) system method of repeatedly stacking ZnO and Al2O3 layers. The influences of Al cycle ratio (0, 2, 3, and 4%) on optical property, conductivity, crystallinity, surface morphology, and material components of the AZO films are examined, and current conduction mechanisms of the AZO films are analyzed. We found that Al doping increases electron concentration and optical bandgap width, allowing the AZO films to excellently combine low resistivity with high transmittance. Besides, Al doping induces preferred-growth-orientation transition from (002) to (100), which improves surface property and enhances current conduction across the AZO films. Interestingly, the AZO films with an Al cycle ratio of 3% show preferable film properties. Transparent ZnO thin film transistors (TFTs) with AZO electrodes are fabricated, and the ZnO TFTs exhibit superior transparency and high performance. This work accelerates the practical application of the ALD process in fabricating transparent electrodes.

Small ◽  
2022 ◽  
pp. 2105513
Joel R. Schneider ◽  
Camila Paula ◽  
Jacqueline Lewis ◽  
Jacob Woodruff ◽  
James A. Raiford ◽  

2022 ◽  
Lowie Henderick ◽  
Ruben Blomme ◽  
Matthias Marcus Minjauw ◽  
Jonas Keukelier ◽  
Johan Meersschaut ◽  

A plasma-enhanced ALD process has been developed to deposit nickel phosphate. The process combines a trimethylphosphate (TMP) plasma with an oxygen plasma and nickelocene at a substrate temperature of 300°C....

2022 ◽  
pp. 131347
Zishuo Li ◽  
Chengming lou ◽  
Guanglu Lei ◽  
Guocai Lu ◽  
Hongyin Pan ◽  

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