Evaluation of phase and transmittance error on deep-UV halftone phase-shift mask

1996 ◽  
Author(s):  
Suigen Kyoh ◽  
Hideaki Sakurai ◽  
Takayuki Iwamatsu ◽  
Akiko Yamada ◽  
Iwao Higashikawa
Keyword(s):  
Phase Shift ◽  
Deep Uv ◽  
Phase Shift Mask

0.12 µm Optical Lithography Performances Using an Alternating Deep UV Phase Shift Mask

1998 ◽  
Vol 37 (Part 1, No. 12B) ◽  
pp. 6714-6717 ◽  
Author(s):  
Yorick Trouiller ◽  
Nicolas Buffet ◽  
Thierry Mourier ◽  
Patrick Schiavone ◽  
Yves Quere
Keyword(s):  
Phase Shift ◽  
Optical Lithography ◽  
Deep Uv ◽  
Phase Shift Mask

Deep-UV attenuated phase-shift mask for a quarter-micrometer photolithography

1995 ◽  
Author(s):  
Suigen Kyoh ◽  
Hideaki Sakurai ◽  
Takayuki Iwamatsu ◽  
Iwao Higashikawa ◽  
Rikiya Taniguchi ◽  
...  
Keyword(s):  
Phase Shift ◽  
Deep Uv ◽  
Phase Shift Mask

A New Inspection Method for Phase-Shift Mask (PSM) on Deep-UV Inspection Light Source

2002 ◽  
Vol 41 (Part 1, No. 6B) ◽  
pp. 4233-4237 ◽  
Author(s):  
Ikunao Isomura ◽  
Hideo Tsuchiya ◽  
Shinji Sugihara ◽  
Kyoji Yamashita ◽  
Mitsuo Tabata
Keyword(s):  
Phase Shift ◽  
Light Source ◽  
Inspection Method ◽  
Deep Uv ◽  
Phase Shift Mask

Monte-Carlo-Based Automatic Design of Chromeless Phase Shift Mask

2004 ◽  
Vol 43 (2) ◽  
pp. 514-517
Author(s):  
Jai-Cheol Lee ◽  
Yong-Ho Oh ◽  
Sungwoo Lim ◽  
Chun Soo Go ◽  
Sung Su Roh
Keyword(s):  
Monte Carlo ◽  
Phase Shift ◽  
Automatic Design ◽  
Phase Shift Mask

Preliminary study of 65 nm node alternating phase-shift mask fabrication

2002 ◽  
Author(s):  
Kouji Hosono ◽  
Naoyuki Ishiwata ◽  
Satoru Asai ◽  
Hiroshi Maruyama ◽  
Yutaka Miyahara ◽  
...  
Keyword(s):  
Phase Shift ◽  
Preliminary Study ◽  
Phase Shift Mask ◽  
Alternating Phase Shift Mask ◽  
Mask Fabrication

Application of alternating phase shift mask to device fabrication

1995 ◽  
Author(s):  
Sunggi Kim ◽  
Sang-Gyun Woo ◽  
Woo-Sung Han ◽  
Young-Bum Koh ◽  
Moon-Yong Lee
Keyword(s):  
Phase Shift ◽  
Device Fabrication ◽  
Phase Shift Mask ◽  
Alternating Phase Shift Mask

Second level exposure for phase shift mask applications using an SLM-based DUV mask writer

2005 ◽  
Author(s):  
Mahesh Chandramouli ◽  
Bob Olshausen ◽  
Yulia Korobko ◽  
Sven Henrichs ◽  
Ping Qu ◽  
...  
Keyword(s):  
Phase Shift ◽  
Phase Shift Mask

Primary processes in e-beam and laser lithographies for phase-shift mask manufacturing II

1993 ◽  
Author(s):  
Masa-aki Kurihara ◽  
Masumi Arai ◽  
Hiroshi Fujita ◽  
Hisashi Moro-oka ◽  
Yoichi Takahashi ◽  
...  
Keyword(s):  
Phase Shift ◽  
Phase Shift Mask
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