Preliminary study of 65 nm node alternating phase-shift mask fabrication

2002 ◽  
Author(s):  
Kouji Hosono ◽  
Naoyuki Ishiwata ◽  
Satoru Asai ◽  
Hiroshi Maruyama ◽  
Yutaka Miyahara ◽  
...  
Keyword(s):  
Phase Shift ◽  
Preliminary Study ◽  
Phase Shift Mask ◽  
Alternating Phase Shift Mask ◽  
Mask Fabrication

Practical phase control technique for alternating phase-shift mask fabrication

2000 ◽  
Author(s):  
Masahiko Takahashi ◽  
Akihiro Miyake ◽  
Hidetaka Saitou ◽  
Hiroyuki Miyashita ◽  
Shiaki M. Murai
Keyword(s):  
Phase Shift ◽  
Phase Control ◽  
Control Technique ◽  
Phase Shift Mask ◽  
Alternating Phase Shift Mask ◽  
Mask Fabrication

Application of alternating phase shift mask to device fabrication

1995 ◽  
Author(s):  
Sunggi Kim ◽  
Sang-Gyun Woo ◽  
Woo-Sung Han ◽  
Young-Bum Koh ◽  
Moon-Yong Lee
Keyword(s):  
Phase Shift ◽  
Device Fabrication ◽  
Phase Shift Mask ◽  
Alternating Phase Shift Mask

Introduction of full-level alternating phase-shift mask technology into IC manufacturing

2002 ◽  
Author(s):  
Joerg Thiele ◽  
Marco Ahrens ◽  
Wolfgang Dettmann ◽  
M. Heissmeier ◽  
Mario Hennig ◽  
...  
Keyword(s):  
Phase Shift ◽  
Ic Manufacturing ◽  
Phase Shift Mask ◽  
Alternating Phase Shift Mask

Technological challenges in implementation of alternating phase-shift mask

2001 ◽  
Author(s):  
Wilman Tsai ◽  
Qi-De Qian ◽  
Ken M. Buckmann ◽  
Wen-Hao Cheng ◽  
Long He ◽  
...  
Keyword(s):  
Phase Shift ◽  
Phase Shift Mask ◽  
Alternating Phase Shift Mask

New double exposure technique without alternating phase-shift mask

2007 ◽  
Author(s):  
Tomohiko Yamamoto ◽  
Teruyoshi Yao ◽  
Hiroki Futatsuya ◽  
Tatsuo Chijimatsu ◽  
Satoru Asai
Keyword(s):  
Phase Shift ◽  
Double Exposure ◽  
Phase Shift Mask ◽  
Exposure Technique ◽  
Alternating Phase Shift Mask

Measurement Method for Odd Component of Aberration Function Utilizing Alternating Phase Shift Mask

1998 ◽  
Vol 37 (Part 1, No. 12B) ◽  
pp. 6709-6713 ◽  
Author(s):  
Shuji Nakao ◽  
Junji Miyazaki ◽  
Kouichirou Tsujita ◽  
Wataru Wakamiya
Keyword(s):  
Phase Shift ◽  
Measurement Method ◽  
Phase Shift Mask ◽  
Alternating Phase Shift Mask

Investigation of Optimum Biasing and Undercut for Single Trench Alternating Phase Shift Mask in 193 nm Lithography

2006 ◽  
Vol 45 (11) ◽  
pp. 8920-8924 ◽  
Author(s):  
Ji-Eun Lee ◽  
Hye-Young Kang ◽  
Dong-Soo Shin ◽  
Hee-Jun Jeong ◽  
Ilsin An ◽  
...  
Keyword(s):  
Phase Shift ◽  
193 Nm ◽  
Phase Shift Mask ◽  
Alternating Phase Shift Mask

Integration of alternating phase-shift mask technology into optical proximity correction

1999 ◽  
Author(s):  
Joerg Thiele ◽  
Christoph M. Friedrich ◽  
Christoph Dolainsky ◽  
Paul Karakatsanis ◽  
Wilhelm Maurer
Keyword(s):  
Phase Shift ◽  
Optical Proximity Correction ◽  
Phase Shift Mask ◽  
Alternating Phase Shift Mask

Phase controllability improvement for alternating phase shift mask

1998 ◽  
Author(s):  
Masami Nara ◽  
Toshifumi Yokoyama ◽  
Hiroshi Fujita ◽  
Hiroyuki Miyashita ◽  
Naoya Hayashi
Keyword(s):  
Phase Shift ◽  
Phase Shift Mask ◽  
Alternating Phase Shift Mask
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