Photo-ablation lithographic technique at 172 nm based upon flat excimer lamps (Conference Presentation)

Author(s):  
Andrey E. Mironov ◽  
Dane J. Sievers ◽  
Jinhong Kim ◽  
Sung-Jin Park ◽  
James G. Eden
Keyword(s):  
2007 ◽  
Vol 2007 (8) ◽  
pp. 8954-8965
Author(s):  
Zorana Naunovic ◽  
Kelly L. Pennell ◽  
Chengyue Shen ◽  
Po-Shun Chan ◽  
Soojung Lim ◽  
...  

2010 ◽  
Vol 43 (44) ◽  
pp. 445202 ◽  
Author(s):  
A Belasri ◽  
K Khodja ◽  
S Bendella ◽  
Z Harrache

2000 ◽  
Vol 7 (5) ◽  
pp. 2186-2191 ◽  
Author(s):  
Karl H. Schoenbach ◽  
Ahmed El-Habachi ◽  
Mohamed M. Moselhy ◽  
Wenhui Shi ◽  
Robert H. Stark

2001 ◽  
Vol 45 (8) ◽  
pp. 1413-1431 ◽  
Author(s):  
Ian W. Boyd ◽  
Jun-Ying Zhang
Keyword(s):  

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