Critical Aspects of Chemical Etch Patterning of Magnetic Tunnel Junction-Based MRAM

2019 ◽  
Vol 16 (20) ◽  
pp. 1-18
Author(s):  
Eugene J. O'Sullivan ◽  
David Abraham
Keyword(s):  
Tunnel Junction ◽  
Magnetic Tunnel Junction ◽  
Chemical Etch ◽  
Critical Aspects

Normalization and correction factors for magnetic tunnel junction sensor performances comparison

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scholarly journals Nanoscale domain wall devices with magnetic tunnel junction read and write

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Nuo Xu ◽  
Hong Chen ◽  
Stefano Cabrini ◽  
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Tunnel Junction ◽  
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scholarly journals Domain wall-magnetic tunnel junction spin–orbit torque devices and circuits for in-memory computing

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Thomas Leonard ◽  
Can Cui ◽  
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A domain wall-magnetic tunnel junction artificial synapse with notched geometry for accurate and efficient training of deep neural networks

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Can Cui ◽  
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