Pattern Formation during Anodic Etching of Semiconductors

2019 ◽  
Vol 33 (20) ◽  
pp. 11-28 ◽  
Author(s):  
Helmut Föll ◽  
Juergen Carstensen
Keyword(s):  
Pattern Formation ◽  
Anodic Etching

Pattern Formation during Anodic Etching of Semiconductors

2011 ◽  
Vol 158 (6) ◽  
pp. D357 ◽  
Author(s):  
H. Föll ◽  
J. Carstensen
Keyword(s):  
Pattern Formation ◽  
Anodic Etching

Pattern formation in the splay Freedericks transition of a nematic side-group polysiloxane

1993 ◽  
Vol 3 (6) ◽  
pp. 865-889 ◽  
Author(s):  
Norbert Schwenk ◽  
Hans Wolfgang Spiess
Keyword(s):  
Pattern Formation ◽  
Side Group

Pattern Formation in a Twisted Nematic Liquid Crystal Cell under an External Magnetic Field

1996 ◽  
Vol 6 (2) ◽  
pp. 235-253 ◽  
Author(s):  
Luca Carlotti ◽  
Sandro Faetti ◽  
Maurizio Nobili
Keyword(s):  
Magnetic Field ◽  
Liquid Crystal ◽  
External Magnetic Field ◽  
Pattern Formation ◽  
Nematic Liquid Crystal ◽  
Liquid Crystal Cell ◽  
Crystal Cell ◽  
Twisted Nematic ◽  
Twisted Nematic Liquid Crystal

SPATIAL PATTERN FORMATION IN FMR – AN EXAMPLE FOR NONLOCAL DYNAMICS

1988 ◽  
Vol 49 (C8) ◽  
pp. C8-1597-C8-1598 ◽  
Author(s):  
F. J. Elmer
Keyword(s):  
Pattern Formation ◽  
Spatial Pattern ◽  
Spatial Pattern Formation

Pattern Formation in Thin Polymer Films: A New Morphology

2000 ◽  
Vol 629 ◽  
Author(s):  
Jean-Loup Masson ◽  
Peter F. Green
Keyword(s):  
Growth Rate ◽  
Pattern Formation ◽  
Early Stage ◽  
Structural Evolution ◽  
Distinct Form ◽  
Thin Polymer Films ◽  
Intermediate Morphology ◽  
Thin Polymer ◽  
Nonwetting Liquid ◽  
Cylindrical Holes

ABSTRACTResearchers have shown that thin, nonwetting, liquid homopolymer films dewet substrates, forming patterns that reflect fluctuations in the local film thickness. These patterns have been shown to be either discrete cylindrical holes or bicontinuous “spinodal-like” patterns. In this paper we show the existence of a new morphology. During the early stage of dewetting, discrete highly asymmetric holes appear spontaneously throughout the film. The nucleation rate of these holes is faster than their growth rate. The morphology of the late stage of evolution, after 18 days, is characterized by a bicontinuous pattern, distinct form conventional spinodal dewetting patterns. This morphology has been observed for a range of film thicknesses between 7.5 and 21nm. The structural evolution of this intermediate morphology is discussed.

CONVECTION AND PATTERN FORMATION OF MICRO-ORGANISMS IN A STRATIFIED FLUID

2008 ◽  
Author(s):  
Q. T. Mach ◽  
The Hung Nguyen ◽  
Georges LePalec
Keyword(s):  
Pattern Formation ◽  
Stratified Fluid ◽  
Micro Organisms

Pattern Formation Survey on Non Uniformly Forced Swift-Hohenberg Equation

2019 ◽  
Author(s):  
Daniel Coelho ◽  
José da Rocha Miranda Pontes ◽  
Norberto Mangiavacchi
Keyword(s):  
Pattern Formation
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