Influence of O2Gas on Etch Profile of Magnetic Tunnel Junction Stacks Etched in a CH4/O2/Ar Plasma
2012 ◽
Vol 1
(5)
◽
pp. P233-P236
◽
2012 ◽
Vol 159
(3)
◽
pp. H230-H234
◽
2011 ◽
Vol 11
(7)
◽
pp. 6616-6620
◽
Keyword(s):