2015 ◽  
Vol 103 ◽  
pp. 338-351 ◽  
Author(s):  
Llorenç Burgas ◽  
Joaquim Melendez ◽  
Joan Colomer ◽  
Joaquim Massana ◽  
Carles Pous

1997 ◽  
Vol 40 (2) ◽  
pp. 23-30
Author(s):  
Douglas Montgomery ◽  
J. Keats ◽  
John Fowler ◽  
George Runger ◽  
Geetha Rajavelu

Monitoring of particle contamination by statistically based methods is used extensively in semiconductor manufacturing. Often Shewhart-type control charts are used for this purpose. These charts suffer from some potential disadvantages in this application environment. Specifically, they are slow to detect shifts or changes in the level of particle contamination and, in some situations, the underlying statistical assumptions of the charts are inappropriate for contamination data. We suggest the use of cumulative sum and exponentially weighted moving average control charts for monitoring particle contamination. The advantages of these charts for the types of particle contamination data typically encountered in semiconductor manufacturing are discussed and illustrated with examples.


2011 ◽  
Vol 35 (11) ◽  
pp. 2457-2468 ◽  
Author(s):  
Nazatul Aini Abd Majid ◽  
Mark P. Taylor ◽  
John J.J. Chen ◽  
Brent R. Young

2020 ◽  
Vol 205 ◽  
pp. 112317 ◽  
Author(s):  
Bilal Taghezouit ◽  
Fouzi Harrou ◽  
Ying Sun ◽  
Amar Hadj Arab ◽  
Cherif Larbes

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