Extension of Photopolymerization Region from the Nanoscale to the Macroscopic Scale Using a Chemically Amplified Photoresist

2015 ◽  
Vol 88 (2) ◽  
pp. 277-282
Author(s):  
Ryoji Takahashi ◽  
Satoshi Kaneko ◽  
Shintaro Fujii ◽  
Manabu Kiguchi
Keyword(s):  
Macroscopic Scale ◽  
Chemically Amplified ◽  
Chemically Amplified Photoresist

INR negative resist: a negative-tone I-line chemically amplified photoresist

1994 ◽  
Author(s):  
Leo L. Linehan ◽  
Gary T. Spinillo ◽  
Randolph S. Smith ◽  
Wayne M. Moreau ◽  
Barry C. McCormick ◽  
...  
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Photoresist ◽  
Negative Tone

Performance of a 55-micron copper pillar bump process using a positive thick chemically amplified photoresist

2007 ◽  
Author(s):  
Dennis Crapse ◽  
Warren W. Flack ◽  
Ha-Ai Nguyen ◽  
Elliott Capsuto ◽  
Craig McEwen
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Photoresist

Effect of surfactant-added developer on development of the chemically amplified photoresist

2000 ◽  
Author(s):  
Satoshi Kawada ◽  
Yukio Tamai ◽  
Shunkichi Omae ◽  
Tadahiro Ohmi
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Photoresist

scholarly journals Chemically Amplified Photoresist for Electron Beam Lithography

2003 ◽  
Vol 16 (3) ◽  
pp. 451-454 ◽  
Author(s):  
Youngmin Choi ◽  
Sang-Wook Park ◽  
Yongil Kim ◽  
Haiwon Lee
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Chemically Amplified ◽  
Chemically Amplified Photoresist

Lithographic performance of an environmentally stable chemically amplified photoresist (ESCAP)

1996 ◽  
Author(s):  
Will Conley ◽  
Gregory Breyta ◽  
William R. Brunsvold ◽  
Richard A. Di Pietro ◽  
Donald C. Hofer ◽  
...  
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Photoresist
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